1 |
G. M. Ingo, N. Zacchetti, D. delia Sala, and C. Coluzza, ' X-Ray Photoelectron Spectroscopy Investigation on the Chemical Structure of Amorphous Silicon Nitride (a- ),' J. Vac. Sci. Tech., A7 [5] 3048-55 (1989)
|
2 |
R. Padmanabhan and N. C. Saha, ' X-Ray Photoelectron and Auger Electron Spectroscopy Studies of Photochemical Vapor Deposition Silicon Nitrides,' J. Vac. Sci. Tech., A6 [4] 2226-31 (1988)
|
3 |
I. Umezu, T. Yamaguchi, K. Kohno, M. Inada, and A. Sugimura, ' Preparation of Film by Pulsed Laser Ablation in Nitrogen Gas Ambient,' Appl. Surf. Sci., 197-198 376-78 (2002)
DOI
ScienceOn
|
4 |
H. Matsuki, K. Hoshino, T. Taguchi, Y. Ueno, and T. Hattori, ' Analysis of Plasma-Deposited Films Using XPS,' Techn. Report Inst. Electronics, Infomation, and Comm. Engr., 93 [46] 25-30 (1993)
|
5 |
N. Niederhofer, P. Nesladek, H. D. Mannling, K. Moto, S. Veprek, and M. Jilek, ' Structural Properties, Internal Stress and Thermal Stability of nc-TiN/a-SiN, nc-TiN/Ti- and nc-( )N Superhard Nanocomposite Coatings Rearchjng the Hardness of Diamond,' Surf. and Coat. Tech., 120-121 173-78 (1999)
DOI
ScienceOn
|
6 |
J. Patscheider, T. Zehnder, and M. Diserens, ' Structure-Performance Relations in Nanocomposite Coatings,' Surf. and Coat. Tech., 146-147 201-08 (2001)
DOI
ScienceOn
|
7 |
M. Diserens, J. Patschejder, and F. Levy, ' Improving the Properties of Titanium Nitride by Incorporation of Silicon,' Surf. and Coat. Tech., 108-109 241-46 (1998)
DOI
ScienceOn
|
8 |
F. Vaz, L. Rebouta, P. Goudeau, T. Gnardeau, J. Pacaud, J. P. Riviere, and A. Traverse, ' Structural Transitions in Hard Si-Based TiN Coatings: The Effect of Bias Voltage and Temperature,' Surf. and Coat. Tech., 146-147 274-79 (2001)
DOI
ScienceOn
|
9 |
F. Vaz, L. Rebouta, P. Goudeau, J. Pacaud, H. Garem, J. P. Riviere, A. Cavaleiro, and E. Alves, ' Characterization of Nanocomposite Films,' Surf. and Coat. Tech., 133-134 307-13 (2000)
DOI
ScienceOn
|
10 |
H. Kakinuma, M. Mohri, M. Sakamoto, and T. Tsuruoka, ' Structural Properties of Polycrystalline Silicon Films Prepared at Low Temperature by Plasma Chemical Vapor Deposition,' J. Appl. Phys., 70 [12] 7374-81 (1991)
DOI
|
11 |
R. J. Temkin, 'An Analysis of the Radial Distribution Function of ,' J. Non-Crystalline Solids, 17 [2] 215-30 (1975)
DOI
ScienceOn
|
12 |
Z. Igbal, S. Vepick, A. P. Webb, and P. Capezzuto, ' Raman Scattering from Small Particle Size Polycrystalline Silicon,' Solid State Comm., 37 993-96 (1981)
DOI
ScienceOn
|
13 |
V. A. Volodin, M. D. Efremov, V. A. Gritsenko, and S. A. Kochubei, 'Raman Study of Silicon Nanocrystals Formed in Films by Excimer Laser or Thermal Annealing,' Appl. Phys. Lett., 73 [9] 1212-14 (1998)
DOI
ScienceOn
|
14 |
J. Zi, H. Buscher, C. Falter, W. Lduwing, K. Zhang, and X. Xie, ' Raman Shifts in Si Nanocrystals,' Appl. Phys. Lett., 69 [2] 200-02 (1996)
DOI
ScienceOn
|
15 |
H. Hayashi, K. Wakita, Y. Nakayama, and T. Kawamura, ' Nano-Crystalline Silicon in a- :H Films,' Tech. Report Inst. Electronics, Infomation, and Comm. Eng., 91 [362] 45-9 (1991)
|
16 |
E. Dehan, P. Temple-Boyer, R. Henda, J. J. Pedroviejo, and E. Scheid, ' Optical and Structural Properties of and Materials,' Thin Solid Films, 266 14-9 (1995)
DOI
ScienceOn
|
17 |
J. Robertson, ' The Electronic Properties of Silicon Nitride,' Phil. Mag. B, 44 [2] 215-37 (1981)
DOI
|
18 |
J. Finster, E.-D. Klinkenberg, and J. Heeg, ' ESCA and SEXAFS Investigations of Insulation Materials for ULSI Microelectromics Vacuum,' 41 [7-9] 1586-89 (1990)
|
19 |
J. Masek and J. J Mares, ' Model of Inactive Nitrogen Incorporation in Amorphous Silicon: Nitridated Vacancy,' Phys. Status Sol. B, 135 [1] K33-K38 (1986)
DOI
ScienceOn
|
20 |
G. M. Ingo and N. Zacehetti, ' XPS Investigation on the Growth Model of a- and Silicon and Nitrogen Chemical Bondings,' High Temp. Sci., 28 137-51 (1990)
|
21 |
S. Veprek and A. S. Argon, ' Mechanical Properties of Superhard Nanocomposites,' Surf. and Coat. Tech., 146-147 175-82 (2001)
DOI
ScienceOn
|
22 |
V. Gottschalch, R. Schmidt, B. Rheinlander, D. Pudis, S. Hardt, J. Kvietkova, G Wagner, and R. Franzheld, ' Plasma-Enhanced Chemical Vapor Deposition of / Bragg Reflectors,' Thin Solid Films, 416 224-32 (2002)
DOI
ScienceOn
|
23 |
S. Veprek, A. Niederhofer, K. Moto, T. Bolom, H. D. Mannling, P. Nesladek, G. Dollinger, and A. Bergmaier, ' Composition, Nanostructure, and Origin of the Ultrahardness in nc-TiN/a- /a- and nc- Nanocomposites with Hv = 80 to 105 GPa,' Surf. and Coat. Tech., 133-134 152-59 (2000)
DOI
ScienceOn
|
24 |
J. Petalas and S. Logothetidis, 'Tetrahedron-Model Analysis of Silicon Nitride Thin Film and the Effect of Hydrogen and Temperature on their Optical Properties,' Phys. Rev. B, 50 [16] 11801-16 (1994).
DOI
ScienceOn
|
25 |
H. R. Philipp, 'Optical and Bonding Model for Non-Crystalline and Materials,' J. Non-Crystalline Solids, 8-10 627-32 (1972)
DOI
ScienceOn
|