Effect of Pulse Frequency on the Properties of ZnO:Al Thin Films Prepared by Pulsed DC Magnetron Sputtering |
고형덕
(성균관대학교 정보통신용 신기능성 소재 및 공정연구센터)
이충선 (아주대학교 물리학) 태원필 (인하대학교 소재연구) 서수정 (성균관대학교 정보통신용 신기능성 소재 및 공정연구센) 김용성 (성균관대학교 정보통신용 신기능성 소재 및 공정연구센터) |
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Electrical and Structual Properties of ZnO Thin Films Deposited by Magnetron Sputtering
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Influence of Target-to-Substrate Distance on the Properties of AZO Films Grown by RF Magnetron Sputtering
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DOI ScienceOn |
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Photoluminescence of ZnO Films Excited with Light of Different Wavelength
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Al-Doped ZnO Thin Films by Sol-Gel Method
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The Effects of R. F. Power and Substrate Temperature on the Properties of ZnO Films
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Band Gap Energy of Pure and Al-Doped ZnO Thin Films
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DOI ScienceOn |
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Requirements of Power Supply Parameters for High-Power Pulsed Magnetron Sputtering
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Surface Defects and Generation in Reactive Magnetron Sputtering of Aluminium Oxide Thin Films
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DOI ScienceOn |
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Optimization of the Electrical Properties of Magnetron Sputtered Aluminum-Doped Zinc Oxide Films for Opto-Electronic Applications
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Luminescence Properties of ZnO Films Annealed in Growth Ambient and Oxygen
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Properties of Transparent Conductive ZnO:Al Thin Films Prepared by Magnetron Sputtering
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DOI ScienceOn |
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Optimisation of ZnO:Al Films by Change of Sputter Gas Pressure for Solar Cell Application
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DOI ScienceOn |
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DC Reactive Sputter Deposition of ZnO:Al Thin Film on Glass
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Photoluminescence of ZnO Films Prepared by R. F. Sputtering on Different Substrates
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DOI ScienceOn |
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A Comparison of the Properties of Titanium-Based Films Produced by Pulsed and Continuous DC Magnetron Sputtering
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DOI ScienceOn |
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Pulse-Sputter Deposition of Highly<100>-Oriented Crystalline Silicon Films
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DOI ScienceOn |
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