1 |
K. L. Chopra, S. Major, and D. K. Pandya, 'Transparent Conductors-A Status Review,' Thin Sotid Films, 102 1-46 (1983)
DOI
ScienceOn
|
2 |
L. Davis, 'Properties of Transparent Conducting Oxides Deposited at Room Temperature,' Thin Solid Films, 236 1-5 (1993)
DOI
ScienceOn
|
3 |
'Electrical Properties of Sputtered Gallium-doped Zinc Oxide Film Deposited Using Ne, Ar, or Kr Gas,' 39 [10] 935-42 (2002)
DOI
ScienceOn
|
4 |
K. S. Kim, J. Y. Seo, H. Y. Lee, and K. H. Kim, 'Deposition Behaviors and Electrical Properties of Sb-doped SnO_2 Films by Plasma Enhanced Chemical Vapor Deposition,' 37 [2] 194-200 (2000)
|
5 |
Radhouane Bel Hadj Tahar, T. Ban, Y. Ohya, and Y. Takahashi, 'Tin Doped Indium Oxide Thin Films: Electhcal Properties,' J. Appl. Phys., 83 [5] 2631-45 (1998)
DOI
ScienceOn
|
6 |
B. H. Lee, I. G. Kim, and S. W. Cho, 'Effect of Process Parameters on the Characteristics of Indium Tin Oxide Thin Film for Flat Panel Display Application,' Thin Solid Films, 302 25-30 (1997)
DOI
ScienceOn
|
7 |
H. Ma, J. S. Cho, and C. H. Park, 'Study of Indium Tin Oxide Thin Film Deposited at Low Temperaure Using Facing Target Sputtering System,' Surf. and Coat. Technol., 153 131-37 (2002)
DOI
ScienceOn
|
8 |
S. Laux, N. Kaiser, and H. Lauth, 'Room-temperature Deposition of Indium Tin Oxide Films with Plasma Ion-assisted Evaporation,' Thin Solid Films, 335 1-5 (1998)
DOI
ScienceOn
|
9 |
Z. C. Zin, L. Hamberg, and C. G. Granqvist, 'Optical Properties of Sputter-deposited Zn0:A1 Thin Films,' J. Appl.Phys., 64 [10] 5117-38 (1988)
DOI
|
10 |
T. Minami, H. Nanto, and S. Takada, 'Highly Conductive and Transparent Aluminum Doped Zinc Oxide Thin Films Prepared by R. F. Magnetron Sputtering,' Jpn. J. Appl. Phys., 280-82 (1984)
|
11 |
P. Nunes, E. Fortunato, and R. Martins, 'Influence of the Post-treatment on the Properties of ZnO Thin Films,' Thin Solid Films, 383 277-80 (2001)
DOI
ScienceOn
|
12 |
P. Nunes, E. Fortunato, and P. Tonello, 'Effect of Different Dopant Elements on the Properties of ZnO Thin Films,' Vacuum, 64 281-85 (2002)
DOI
ScienceOn
|
13 |
Y.-J. Lin and C.-J. Wu, 'The Properties of Antimony-doped Tin Oxide Thin Films from the Sol-gel Process,' Surf. and Coat. Technol., 88 239-47 (1996)
|
14 |
C.-H. Lee, S.-I. Kim, and H.-S. Shin, 'A Study on the Charactehstics of MgO Thin Films Prepared by Electron Beam,' 39 [12] 1171-76 (2002)
DOI
ScienceOn
|
15 |
F. C. M. van del Pol, F. R. Blom, and J. A. Pompa, 'R. F. Planar Magnetron Sputtered ZnO Films : Electrical Properties,' Thin Solid Films, 204 365-76 (1991)
DOI
ScienceOn
|
16 |
B. E. Sernelius, 'Self-energy Shifts in Heavily Doped, Polar Semiconductors,' Phys. Rev. B, 36 4478-887 (1987)
|
17 |
I. Hamberg, C. G. Granqvist, K. F. Berggren, B. E. Sernelius, and L. Engstron, 'Band Gap Widening in Heavily Sn-doped In ,' Phys. Rev. B, 30 3240-49 (1984)
DOI
|