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Young Joon Cho, Hyo Sik Chang, Ju Yeon Choi, "Comparison of Methods to Remove the Boron Rich Layer Formed at Boron Doping Process for c-Si Solar Cell Applications," Transactions on Electrical and Electronic Materials, vol. 28, no. 10, pp. 665-669, 2015. DOI: https://doi.org/10.4313/JKEM.2015.28.10.665
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In Hwan Yeo, Hae Sung Cho, Ju Eok Park, Donggun Lim, Jun Hee Kim, "Optimizing of Diffusion Condition in Spin on Doping for c-Si Solar Cell,"Transactions on Electrical and Electronic Materials, vol. 26. no. 5, pp. 410-414, 2013. DOI: https://doi.org/10.4313/JKEM.2013.26.5.410
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Yuta Miura, Takashi Nishida, Masahiro Echizen, Yasuaki Ishikawa, Kiyoshi Uchiyama, and Yukiharu Uraoka, "Low-Operating-Voltage Solution-Processed InZnO Thin-Film TransistorsUsing High-k ", Japanese Journal of Applied Physics, vol. 51, pp. 03CB05, 2012. DOI: https://doi.org/10.7567/JJAP.51.03CB05
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Teresa. Oh, "Tunneling Condition at High Schottky Barrier and Ambipolar Transfer Characteristics in Zinc Oxide Semiconductor Thin Film Transistor", Materials Research Bulletin, Vol 77, pp. 1-7, 2016. DOI: https://doi.org/10.1016/j.materresbull.2015.11.038
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Kyonghwan Oh and Oh-Kyong Kwon, "Threshold-Voltage-Shift Compensation and Suppression Method Using Hydrogenated Amorphous Silicon Thin-Film Transistors for Large Active Matrix Organic Light-Emitting Diode Displays", Japanese Journal of Applied Physics, vol. 51, pp. 03CD01, 2012. DOI: https://doi.org/10.7567/JJAP.51.03CD01
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T. Oh and C. H. Kim "Study on Characteristic Properties of Annealed SiOC Film Prepared by Inductively Coupled Plasma Chemical Vapor Deposition", IEEE Trans. Plasma Science, vol. 38, pp. 1598-1602, 2010. DOI: https://doi.org/10.1109/TPS.2010.2049665
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John Robertson, Robert M. Wallace, "High-K materials and metal gates for CMOS applications", Materials Science and Engineering R, vol. 88, pp. 1-41. 2015. DOI: https://doi.org/10.1016/j.mser.2014.11.001
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Narendra Kumar, Satyendra Kumar, Jitendra Kumar and Siddhartha Pandaa, "Investigation of Mechanisms Involved in the Enhanced Label Free Detection of Prostate Cancer Biomarkers Using Field Effect Devices", Journal of The Electrochemical Society, vol. 164, no. 9, pp. B409-B416, 2017. DOI: https://doi.org/10.1149/2.0541709jes
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Tae Eun Park, Dong Chan Kim, Bo Hyun Kong and Hyung Koun Cho, "Structural and potical properties of ZnO thin films grown by RF magnetron sputtering on Si substrates", Journal of the Korean Physical Society, vol. 45, pp. S697-S700, 2004.
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T. Oh and C. K. CHoi "Comparison between SiOC thin film fabricated by using plasma enhance chemical vapor deposition and thin film by using fourier transform infrared spectroscopy", Journal of the Korean Physical Society, vol. 56, pp. 1150-1155, 2010. DOI: https://doi.org/10.3938/jkps.56.1150
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