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http://dx.doi.org/10.5762/KAIS.2016.17.7.420

Photocatalyst characteristic of WO3 thin film with sputtering process  

Lee, Boong-Joo (Department of Electronic Engineering, Namseoul University)
Publication Information
Journal of the Korea Academia-Industrial cooperation Society / v.17, no.7, 2016 , pp. 420-424 More about this Journal
Abstract
In this study, we developed photocatalytic technology to address the emerging serious problem of air pollution through indoor air cleaning. A single layer of $WO_3$ was prepared by using the dry process of general RF magnetron sputtering. At a base vacuum of $1.8{\times}10^{-6}$[Torr], the optical and electrical properties of the resulting thin films were examined for use as a transparent electrode as well as a photocatalyst. The single layer of $WO_3$ prepared at an RF power of 100 [W], a pressure of 7 [mTorr] and Ar and $O_2$ gas flow rates of 70 and 2 sccm, respectively, showed uniform and good optical transmittance of over 80% in the visible wavelength range from 380 [nm] to 780 [nm]. The optical catalyst characteristics of the $WO_3$ thin film were examined by investigating the optical absorbance and concentration variance in methylene blue, where the $WO_3$ thin film was immersed in the methylene blue. The catalytic characteristics improved with time. The concentration of methylene blue decreased to 80% after 5 hours, which confirms that the $WO_3$ thin film shows the characteristics of an optical catalyst. Using the reflector of a CCFL (cold cathode fluorescent lamp) and the lens of an LED (lighting emitting diode), it is possible to enhance the air cleaning effect of next-generation light sources.
Keywords
Optical catalyst characteristic; WO3 thin film; methylene blue; RF magnetron sputtering;
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Times Cited By KSCI : 2  (Citation Analysis)
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