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http://dx.doi.org/10.5762/KAIS.2016.17.10.9

Effect of process parameter of DC pulsed sputtering on optical reflectance of multi-layer thin films  

Chung, Youn-Gil (Dept. of Electrical, Electronic and Control Engineering, Graduate School of Future Convergence Technology, Institute for information technology convergence, Hankyong National University)
Park, Hyun-Sik (Dept. of Electrical, Electronic and Control Engineering, Graduate School of Future Convergence Technology, Institute for information technology convergence, Hankyong National University)
Publication Information
Journal of the Korea Academia-Industrial cooperation Society / v.17, no.10, 2016 , pp. 9-12 More about this Journal
Abstract
The process parameters of DC pulsed sputtering to produce a multi-layer thin film with light reflectance at a specific wavelength region were studied. The optical simulation of multi-layer thin films of the silicon dioxide ($SiO_2$) films with a low refractive index and the titanium dioxide ($TiO_2$) films with a high refractive index was done. Under a DC pulsed sputtering power of 2kW and 200 sccm(standard cubic centimeter per minute) argon gas, the silicon dioxide films with a refractive index of 1.46 in the range of oxygen gas ratios of 12% and a titanium dioxide film with a refractive index of 2.27 in the range of oxygen gas ratios of 1% were produced. The multi-layer structure of high refractive index/low refractive index/high refractive index was designed and fabricated. The characteristics of the fabricated multi-layer thin film structure showed a reflectance of more than 45% in the range, 780 to 1200nm. This multi-layer structure is expected to be used to block the near infrared wavelength light.
Keywords
Sputtering; DC pulsed; thin film; refractive index; reflectance;
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Times Cited By KSCI : 1  (Citation Analysis)
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