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http://dx.doi.org/10.5762/KAIS.2013.14.9.4467

Study on the FPCS for Photoresist Coating of Semiconductor Manufacturing Process  

Park, Hyoung-Keun (Department of Electronic Engineering, Namseoul University)
Publication Information
Journal of the Korea Academia-Industrial cooperation Society / v.14, no.9, 2013 , pp. 4467-4471 More about this Journal
Abstract
In this research, developed full-scan photoresist coating system(FPCS) can improve the efficiency of the photoresist coating system essential for spinner equipment in nano semiconductor manufacturing process. The devices developed in this research, which can be swiftly replaced in case abnormal state element changes or wafer manufacturing defect occurs, are anticipated to improve module yield as well as real-time monitoring on the state element in order to prevent the complex process defect due to the photoresist miss coating.
Keywords
FPCS; Spinner; Photoresist; Semiconductor; Full-scan;
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