Browse > Article
http://dx.doi.org/10.5762/KAIS.2012.13.9.3835

A Study on the Filling Process and Residual Layer Formation in Nanoimprint Lithography Process  

Lee, Ki-Yeon (Department of Mechanical Engineering, SoonChunHyang University)
Kim, Kug-Weon (Department of Mechanical Engineering, SoonChunHyang University)
Publication Information
Journal of the Korea Academia-Industrial cooperation Society / v.13, no.9, 2012 , pp. 3835-3840 More about this Journal
Abstract
Nanoimprint lithography (NIL) is an emerging technology enabling cost-effective and high-throughput nanofabrication. Recently a lot of research for the nanoimprint have been carried out, but almost are about merely experimental result relating to the material operation and the imprint fabrication, and numerical analysis relating to the understanding of the imprint process with R&D level. In this paper, the viscoelasticity analysis model is developed using the finite element method. With this model, the filling process and residual layer formation in nanoimprint are analyzed, which is evaluated by a nanoimprint experiment.
Keywords
Viscoelasticity analysis model; Filling process; Residual layer; Nanoimprint experiment;
Citations & Related Records
Times Cited By KSCI : 1  (Citation Analysis)
연도 인용수 순위
1 Chou, S.Y. and Krauss, P.R., "Imprint lithography with sub-100nm feature size and high throughput", Microelectronic Engineering, Vol.35, pp. 237-240, 1997.   DOI   ScienceOn
2 Hong, S.H., Bae, B.J., Hwang, J.Y., Hwang, S.Y., Lee, H., "Replication of high ordered nano-sphere array by nanoimprint lithography", Microelectronic Engineering, Vol. 86, pp. 2423- 2426, 2009.   DOI
3 Guo, L.J., "Nanoimprint Lithography: Methods and Material Requirements", Advanced Materials, Vol.19, pp. 495-513, 2007.   DOI   ScienceOn
4 Kim, N.W., Kim, K.W., and Sin, H.-C., "A Viscoelastic Finite Element Analysis of Thermal Nanoimprint Lithogrphy Process", Journal of the Microelectronics & Packaging Society, Vol. 14, No.4, pp.. 1-7, 2007
5 Lee, Y.H., Kim, N W., Sin, H.-C., " Effect of Boundary Slip Phenomena in Nanoimprint Lithography Process", Transactions of the Korean Society of Machine Tool Engineers, Vol. 18, No. 2, pp. 144-153, 2009.   과학기술학회마을
6 Zichao Song, "Study of Demolding Process in Thermal Imprint Lithography via Numerical Simulation and Experimental Approaches", M.S. Thesis, Louisiana State University 2007.
7 ABAQUS User Manual