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http://dx.doi.org/10.5762/KAIS.2012.13.3.1279

Correlation between Chemical Shift and Optical Properties and of SiOC Films  

Oh, Teresa (Division of Semiconductor Design, Cheongju University)
Publication Information
Journal of the Korea Academia-Industrial cooperation Society / v.13, no.3, 2012 , pp. 1279-1283 More about this Journal
Abstract
SiOC films made by the inductive coupled CVD with dimethyldimethoxysilane were analyzed to find out the correlation between the chemical and optical properties by using the Foruier transform infrared spectroscopy, spectrophotometer and ellipsometer. The bonding structure of SiOC film was formed during the depositeion and the adhesion was increased after annealing process. SiOC film decreased the polarization by the chemical reaction between alkyl group and hydroxyl group, and increased the degree of amorphism. For the range of 950 cm-1 in FTIR spectra, the spectra were divided into two types depending on polar sites. The refractive index of SiOC film with the lowest polarization increased and the thickness of that decreased.
Keywords
SiOC film; Reflectance; Refractive indes; amorphous; FTIR spectra;
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