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Effective Construction Method of Defect Size Distribution Using AOI Data: Application for Semiconductor and LCD Manufacturing  

Ha, Chung-Hun (School of Information & Computer Engineering, Hongik University)
Publication Information
IE interfaces / v.21, no.2, 2008 , pp. 151-160 More about this Journal
Abstract
Defect size distribution is a probability density function for the defects that occur on wafers or glasses during semiconductor/LCD fabrication. It is one of the most important information to estimate manufacturing yield using well-known statistical estimation methods. The defects are detected by automatic optical inspection (AOI) facilities. However, the data that is provided from AOI is not accurate due to resolution of AOI and its defect detection mechanism. It causes distortion of defect size distribution and results in wrong estimation of the manufacturing yield. In this paper, I suggest a size conversion method and a maximum likelihood estimator to overcome the vague defect size information of AOI. The methods are verified by the Monte Carlo simulation that is constructed as similar as real situation.
Keywords
defect size distribution; automatic optical inspection; semiconductor and LCD manufacturing; yield estimation; maximum likelihood estimator; Monte Carlo simulation;
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