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Wafer Motion Control of Clean Tube System  

신동헌 (서울시립대학교 기계정보공학과)
최철환 (서울시립대학교 기계정보공학)
정규식 (서울시립대학교 기계정보공학과)
Publication Information
Korean Journal of Air-Conditioning and Refrigeration Engineering / v.16, no.5, 2004 , pp. 475-481 More about this Journal
Abstract
This paper presents a force model of the clean tube system, which was developed as a means of transferring air-floated wafers inside a closed tube filled with super clean air. The recovering force from the holes for floating wafers is modeled as a linear spring and thus the wafers motion is modeled as a mass-spring-damper system. The propelling forces are modeled as linear along with the wafer location. The paper also proposes a control method to emit and stop a wafer at the center of a control unit. It reveals the minimum value of the propelling force to leave from the control unit. In order to stop the wafer, it utilizes the exact time when the wafer arrives at the position to activate the propelling force. Experiments with the clean tube system built for the 12 inch wafer shows the validity of the proposed model and the algorithm.
Keywords
Clean tube system; Wafer; Motion control;
Citations & Related Records
Times Cited By KSCI : 1  (Citation Analysis)
연도 인용수 순위
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