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http://dx.doi.org/10.5695/JSSE.2022.55.6.363

Influence of electron irradiation on the structural and optoelectronics properties of ZTZ thin films prepared by magnetron sputtering  

Cha, Byung-Chul (Advanced Forming Processes R&D Group, Korea Institute of Industrial Technology)
Jang, Jin-Kyu (School of Materials Science and Engineering, University of Ulsan)
Choi, Jin-Young (Advanced Forming Processes R&D Group, Korea Institute of Industrial Technology)
Lee, In-Sik (Advanced Forming Processes R&D Group, Korea Institute of Industrial Technology)
Kim, Dae-Wook (Advanced Forming Processes R&D Group, Korea Institute of Industrial Technology)
Kim, Yu-Sung (Advanced Forming Processes R&D Group, Korea Institute of Industrial Technology)
Kim, Daeil (School of Materials Science and Engineering, University of Ulsan)
Publication Information
Journal of the Korean institute of surface engineering / v.55, no.6, 2022 , pp. 363-367 More about this Journal
Abstract
Transparent ZnO/Ti/ZnO (ZTZ) tri-layered films were prepared with radio frequency (RF) and direct current (DC) magnetron sputtering on the glass substrate. The thickness of the ZnO and Ti films was kept at 50 and 10 nm to consider the effect of the electron irradiation on the crystallization and optoelectrical properties of the films. From the XRD spectra, post-depostion electron irradiated films showed the characteristic peaks of ZnO(002) and Ti(200), respectively. the observed grain size of the ZnO(002) and Ti(200) enlarged up to 18.27 and 12.16 nm at an irradiation condition of 750 eV. In the figure of merit which means an optoelectrical performance of the films, as deposited films show a figure of merit of 2.0×10-5 𝛺-1, while the films electron irradiated at 750 eV show a higher figure of merit of 5.7×10-5 𝛺-1.
Keywords
ZnO; Ti; XRD; AFM; Figure of merit;
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Times Cited By KSCI : 1  (Citation Analysis)
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1 D. Kim, Improved electrical and optical properties of GZO films with a thin TiO2 buffer layer deposited by RF magnetron sputtering, Ceram. Int., 40 (2014) 1457-1460.   DOI
2 S. Peng, T. Yao, Y. Yang, K. Zhang, J. Jiang, K. Jin, G. Li, Y. Wang, Influences of the RF power ratio on the optical and electrical properties of GZO thin films by DC coupled RF magnetron sputtering at room temperature, Physica B., 503 (2016) 111-116.   DOI
3 C. H. Huang, D. Y. Chen, C. Y. Hsu, Influence of deposition parameters and annealing treatment on the properties of GZO films grown using rf magnetron sputtering, Ceram. Int., 38 (2012) 1057-1063.   DOI
4 Y. S. Kim, S. B. Heo, H. M. Lee, Y. J. Lee, D. Kim, Effects of electron irradiation on the properties of GZO films deposited with RF magnetron sputtering, Appl. Surf. Sci., 258 (2012) 3903-3906.   DOI
5 F. Bocchese, D. Cornil, E. Haye, J. Cornil, S. Lucas, Three-zone model for Ti, Al codoped ZnO films deposited by magnetron sputtering, Surf. Interfaces, 28 (2022) 101595.   DOI
6 R. Ade, S. S. Kumar, S, Valanarasu, Enhanced optoelectronic properties of Ti-doped ZnO nanorods for photodetector applications, Ceram. Int., 47 (2021) 24031-24038.   DOI
7 H. Park, H.Choi, N. Lee, H. Jeon, Tuning properties of SnO2/Au/SnO2 multilayer with variable Au thicknesses as transparent conductive oxides, Jpn. J. Appl. Phys., 59 (2020) 105502.   DOI
8 B. D. Cullity, Elements of X-ray diffraction, Addison-Wesley Pub. (1978).
9 B. G. Bagley, Amorphous and liquid semiconductor, Plenum, New York (1974).
10 J. K. Jang, H. J. Kim, J.W. Choi, Y.H. Lee, Y.M. Kong, S.B. Heo, Y.S. Kim, D. Kim, The effect of electron beam surface irradiation on the properties of SnO2/Ag/SnO2 thin films, J. Korean Inst. Surf. Eng., 54 (2021) 302-306.   DOI
11 Y. H. Song, T. Y. Eom, S. B. Heo, D. Kim, Effect of post-deposition rapid thermal annealing on the electrical and optical properties of ZTO/Ag/ZTO tri-layer thin films. J. Korean. Soc. Heat Treat., 30 (2017) 151-155.   DOI
12 R. B. Marcus, Measurements of high speed signals in solid state devices, Academic Press, Inc., (1990).
13 G. Haacke, New figure of merit for transparent conductors, J. Appl. Phys., 47 (1976) 4086.   DOI
14 S. H. Choe, S. B. Heo, J. K. Jang, H. J. Kim, J, W. Choi, D. Kim, Effect of electron irradiation on the optical and electrical properties of TIO/Ag/TIO films, J. Korean Soc. Manuf. Technol. Eng., 30 (2021) 410-414.