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http://dx.doi.org/10.5695/JKISE.2020.53.2.67

Microstrcture and Mechanical Properties of HfN Films Deposited by dc and Inductively Coupled Plasma Assisted Magnetron Sputtering  

Jang, Hoon (Department of Advanced Materials Science and Engineering, Mokpo National University)
Chun, Sung-Yong (Department of Advanced Materials Science and Engineering, Mokpo National University)
Publication Information
Journal of the Korean institute of surface engineering / v.53, no.2, 2020 , pp. 67-71 More about this Journal
Abstract
For deposition technology using plasma, it plays an important role in improving film deposited with high ionization rate through high density plasma. Various deposition methods such as high-power impulse magnetron sputtering and ion-beam sputtering have been developed for physical vapor deposition technology and are still being studied. In this study, it is intended to control plasma using inductive coupled plasma (ICP) antennas and use properties to improve the properties of Hafnium nitride (HfN) films using ICP assisted magnetron sputtering (ICPMS). HfN film deposited using ICPMS showed a finer grain sizes, denser microstructure and better mechanical properties as ICP power increases. The best mechanical properties such as nanoindentation hardness of 47 GPa and Young's modulus of 401 GPa was obtained from HfN film deposited using ICPMS at ICP power of 200 W.
Keywords
Inductively coupled plasma; Inductively coupled plasma assisted magnetron sputtering; Hafnium nitride;
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