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http://dx.doi.org/10.5695/JKISE.2019.52.5.246

High-temperature Corrosion of CrAlSiN Films in Ar/1%SO2 Gas  

Lee, Dong Bok (School of Advanced Materials Science and Engineering, Sungkyunkwan University)
Xiao, Xiao (School of Advanced Materials Science and Engineering, Sungkyunkwan University)
Hahn, Junhee (Center for Materials and Energy Measurements, Korea Research Institute of Standards and Science)
Son, Sewon (Department of Systems Management Engineering, Sungkyunkwan University)
Yuke, Shi (School of Advanced Materials Science and Engineering, Sungkyunkwan University)
Publication Information
Journal of the Korean institute of surface engineering / v.52, no.5, 2019 , pp. 246-250 More about this Journal
Abstract
Nano-multilayered $Cr_{25.2}Al_{19.5}Si_{4.7}N_{50.5}$ films were deposited on the steel substrate by cathodic arc plasma deposition. They were corroded at $900^{\circ}C$ in $Ar/1%SO_2$ gas in order to study their corrosion behavior in sulfidizing/oxidizing environments. Despite the presence of sulfur in the gaseous environment, the corrosion was governed by oxidation, leading to formation of protective oxides such as $Cr_2O_3$ and ${\alpha}-Al_2O_3$, where Si was dissolved. Iron diffused outward from the substrate to the film surface, and oxidized to $Fe_2O_3$ and $Fe_3O_4$. The films were corrosion-resistant up to 150 h owing to the formation of thin ($Cr_2O_3$ and/or ${\alpha}-Al_2O_3$)-rich oxide layers. However, they failed when corroded at $900^{\circ}C$ for 300 h, resulting in the formation of layered oxide scales due to not only outward diffusion of Cr, Al, Si, Fe and N, but also inward movement of sulfur and oxygen.
Keywords
CrAlSiN thin film; Cathodic arc plasma deposition; $SO_2$ corrosion; Oxidation;
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