Effect of Working Pressure and Substrate Bias on the Tribology Properties of the Cr-Al-N Coatings
![]() |
Choi, Seon-A
(Engineering Ceramic Center, Korea Institute of Ceramic Engineering and Technology)
Kim, Seong-Won (Engineering Ceramic Center, Korea Institute of Ceramic Engineering and Technology) Lee, Sungmin (Engineering Ceramic Center, Korea Institute of Ceramic Engineering and Technology) Kim, Hyung-Tae (Engineering Ceramic Center, Korea Institute of Ceramic Engineering and Technology) Oh, Yoon-Suk (Engineering Ceramic Center, Korea Institute of Ceramic Engineering and Technology) |
1 | S. Veprek and M. J. Veprek-Heijman, Industrial applications of superhard nanocomposite coatings, Surf. Coat. Technol. 202 (2008) 5063-5073. DOI |
2 | K.-D. Bouzakis, N. Michailidis, S. Gerardis, G. Katirtzoglou, E. Lili, M. Pappa, et al., Correlation of the impact resistance of variously doped CrAlN PVD coatings with their cutting performance in milling aerospace alloys, Surf. Coat. Technol. 203 (2008) 781-785. DOI |
3 | R. Gahlin, M. Bromark, P. Hedenqvist, S. Hogmark, and G. Hakansson, Properties of TiN and CrN coatings deposited at low temperature using reactive arc-evaporation, Surf. Coat. Technol. 76 (1995) 174-180. |
4 | G. Bertrand, H. Mahdjoub, and C. Meunier, A study of the corrosion behaviour and protective quality of sputtered chromium nitride coatings, Surf. Coat. Technol. 126 (2000) 199-209. DOI |
5 | Y. Chim, X. Ding, X. Zeng, and S. Zhang, Oxidation resistance of TiN, CrN, TiAlN and CrAlN coatings deposited by lateral rotating cathode arc, Thin Solid Films, 517 (2009) 4845- 4849. DOI |
6 | M. S. Kang, T.-g. Wang, J. H. Shin, R. Nowak, and K. H. Kim, Synthesis and properties of Cr- Al-Si-N films deposited by hybrid coating system with high power impulse magnetron sputtering (HIPIMS) and DC pulse sputtering, Trans. Nonferrous Met. Soc. China, 22 (2012) s729-s734. DOI |
7 | M. Li and F. Wang, Effects of nitrogen partial pressure and pulse bias voltage on (Ti, Al) N coatings by arc ion plating, Surf. Coat. Technol. 167 (2003) 197-202. DOI |
8 | X. Wan, S. Zhao, Y. Yang, J. Gong, and C. Sun, Effects of nitrogen pressure and pulse bias voltage on the properties of Cr-N coatings deposited by arc ion plating, Surf. Coat. Technol. 204 (2010) 1800-1810. DOI |
9 | M. Huang, G. Lin, Y. Zhao, C. Sun, L. Wen, and C. Dong, Macro-particle reduction mechanism in biased arc ion plating of TiN, Surf. Coat. Technol., 176 (2003) 109-114. DOI |
10 | E. Fornies, R. E. Galindo, O. Sanchez, and J. Albella, Growth of CrN x films by DC reactive magnetron sputtering at constant N 2/Ar gas flow, Surf. Coat. Technol., 200 (2006) 6047-6053. DOI |
11 | S.-Y Chun, Microstructure and mechanical properties of nanocrystalline TiN films through increasing substrate bias, J. Korean Ceram. Soc., 47 (2010) 479-484. DOI |
12 | J. Bujak, J. Walkowicz, and J. Kusinski, Influence of the nitrogen pressure on the structure and properties of (Ti, Al) N coatings deposited by cathodic vacuum arc PVD process, Surf. Coat. Technol. 180 (2004) 150-157. |
13 | W.-D. Münz, D. Schulze, and F. Hauzer, A new method for hard coatings: ABSTM (arc bond sputtering), Surf. Coat. Technol. 50 (1992) 169-178. DOI |
14 | D. M. Mattox, Handbook of physical vapor deposition (PVD) processing: William Andrew (2010). |
15 | S.-K. Tien, C.-H. Lin, Y.-Z. Tsai, and J.-G. Duh, Effect of nitrogen flow on the properties of quaternary CrAlSiN coatings at elevated temperatures, Surf. Coat. Technol. 202 (2007) 735- 739. DOI |
16 | H.W. Ryu, G.P. Choi, W.-S. Noh, Y.-J. park, and J.S. Park Effect of oxygen flow ratio on the crystallographic orientation of NiO Thin films deposited by RF magnetron sputtering, J. Korean Ceram. Soc., 41 (2004) 106-110. DOI |
17 | J. Musil and S. Kadlec, Reactive sputtering of TiN films at large substrate to target distances, Vacuum, 40 (1990) 435-444. DOI |
18 | T. Elangovan, P. Kuppusami, R. Thirumurugesan, V. Ganesan, E. Mohandas, and D. Mangalaraj, Nanostructured CrN thin films prepared by reactive pulsed DC magnetron sputtering, Mater. Sci. Eng. B, 167 (2010) 17-25. DOI |
19 | M. Egawa, K. i. Miura, M. Yokoi, and I. Ishigami, Effects of substrate bias voltage on projection growth in chromium nitride films deposited by arc ion plating, Surf. Coat. Technol. 201 (2007) 4873-4878. DOI |
20 | G. Contoux, F. Cosset, A. Celerier, and J. Machet, Deposition process study of chromium oxide thin filmsobtained by dc magnetron sputtering, Thin Solid Films, 292 (1997) 75-84. DOI |
21 | D. Mercs, N. Bonasso, S. Naamane, J.M. Bordes, C. Coddet, Mechanical and Tribological Properties of Cr-N and Cr-Si-N coatings reactively sputter deposited, Surf. Coat. Technol. 200 (2005) 403-407. DOI |
22 | B. Bhushan, Development of rf sputtered chromium oxide coating for wear application, Thin Solid Films, 64 (1979) 231-241. DOI |
23 | I.-W. Park, D. S. Kang, J. J. Moore, S. C. Kwon, J. J. Rha, and K. H. Kim. Microstructures, mechanical properties, and tribological behaviors of Cr-Al-N, Cr-Si-N, and Cr-Al-Si-N coatings by a hybrid coating system. Surf. coat. Technol. 201 (2007) 5223-5227. DOI |
24 | J.-W. Lee, S.-K. Tien, and Y.-C. Kuo, The effects of pulse frequency and substrate bias to the mechanical properties of CrN coatings deposited by pulsed DC magnetron sputtering, Thin Solid Films, 494 (2006) 161-167. DOI |
25 | H.-S. Jang, Y.-S. Kim, J.-H. Lee, H.-G. Chun, Y.- Z. You, and D.-I. Kim, Effect of Substrate Bias Voltage on the Growth of Chromium Nitride Films, Korean J. Mater. Res., 17 (2007) 618-621. DOI |
26 | S.A. Choi, S.W. Kim, S.M. Lee, H.T Kim, and Y.S Oh, Effect of Working Pressure and Substrate Bias on Phase Formation and Microstructure of Cr-Al-N Coatings, J. Korean Ceram. Soc., 54 (2017) 511-517. DOI |
27 | A. Lasalmonie and J. Strudel, Influence of grain size on the mechanical behaviour of some high strength materials, J. Mater. Sci. 21 (1986) 1837- 1852. DOI |
28 | Y. Chunyan, T. Linhai, W. Yinghui, W. Shebin, L. Tianbao, and X. Bingshe, The effect of substrate bias voltages on impact resistance of CrAlN coatings deposited by modified ion beam enhanced magnetron sputtering, Applied Surface Science, 255 (2009) 4033-4038. DOI |
29 | M. Egawa, K. i. Miura, M. Yokoi, and I. Ishigami, Effects of substrate bias voltage on projection growth in chromium nitride films deposited by arc ion plating, Surface and Coatings Technology, 201 (2007) 4873-4878. DOI |
30 | M. Li and F. Wang, Effects of nitrogen partial pressure and pulse bias voltage on (Ti, Al) N coatings by arc ion plating, Surface and Coatings Technology, 167 (2003) 197-202. DOI |
![]() |