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http://dx.doi.org/10.5695/JKISE.2017.50.3.192

Development of UBMS(Unbalanced Magnetron Sputtering) System and Ion Current Density Measurement of Copper Target  

Kang, Chunghyeon (Department of Materials Science & Engineering, Kunsan National University)
Joo, Junghoon (Department of Materials Science & Engineering, Kunsan National University)
Publication Information
Journal of the Korean institute of surface engineering / v.50, no.3, 2017 , pp. 192-197 More about this Journal
Abstract
A 6-way-cross consisting of a 2.75-inch CF flange was used as a main chamber on a PFEIFFER VACUUM TMP station based on a 67 l / sec turbo molecular pump and a diaphragm pump to produce a magnet array with a volume ratio of 5.5: 1.A 1-inch diameter copper target and graphite target were fabricated using MDX-1.5K from Advanced Energy Industries, Inc as a DC power supply. Ion current density of copper target and graphite target was measured by unbalanced magnetron sputtering. The basic pressure condition was $6.3{\times}10^{-7}mbar$ and the process pressure was Ar 50 sccm at $1.0{\times}10^{-2}mbar$ (7.5 mTorr) in the Ar atmosphere. Therefore, the relative density of copper ions reaching the substrate with the measured ion current density was derived.
Keywords
UBMS(Unbalanced Magnetron Sputtering); Sputtering; Ion current density;
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