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http://dx.doi.org/10.5695/JKISE.2015.48.2.43

Deposition Characteristics of TiO2 Thin Films Prepared by DC Pulsed Magnetron Sputtering  

An, Eunsol (Korea Institute of Industrial Technology (KITECH))
Heo, Sung-Bo (Korea Institute of Industrial Technology (KITECH))
Kim, Kyu-Sik (Korea Institute of Industrial Technology (KITECH))
Jung, Uoo Chang (Korea Institute of Industrial Technology (KITECH))
Park, Yong Ho (School of Materials Science and Engineering, Pusan National University)
Park, In-Wook (Korea Institute of Industrial Technology (KITECH))
Publication Information
Journal of the Korean institute of surface engineering / v.48, no.2, 2015 , pp. 43-49 More about this Journal
Abstract
This study reports a fabrication of $TiO_2$ on the surface of dental implants by pulsed d.c. magnetron sputtering from a Ti target. A systematic investigation on the microstructure and mechanical properties of $TiO_2$ films was carried out with the variation of $O_2$ contents and substrate temperatures. The effects of deposition parameters on the fabricated structures were investigated by X-ray diffraction (XRD) technique and field emission scanning electron microscope (FE-SEM). Hydrophilic properties were evaluated by measuring water contact angles on the film surface. With increasing $O_2$ contents up to 40%, surface roughness of $TiO_2$ film increased while relatively smooth surface was obtained with 50% $O_2$ contents. Surface roughness and adhesion strength both increased as substrate temperature increased up to $200^{\circ}C$. From these results, hydrophilic and adhesive properties of the present $TiO_2$ films synthesized with 40% $O_2$ at $200^{\circ}C$ are regarded to be suitable for bio-compatible applications.
Keywords
Titanium dioxide; D.C Pulsed Magnetron Sputtering; Oxygen partial pressure; Deposition Temperature; XRD; Contact angle; FE-SEM;
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