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http://dx.doi.org/10.5695/JKISE.2014.47.4.204

Effects of Growth Temperature and Time on Properties of ZnO Nanostructures Grown by Electrodeposition Method  

Park, Youngbin (Department of Nano Engineering, Inje University)
Nam, Giwoong (Department of Nano Engineering, Inje University)
Park, Seonhee (Department of Nano Engineering, Inje University)
Moon, Jiyun (Department of Nano Engineering, Inje University)
Kim, Dongwan (Department of Nano Engineering, Inje University)
Kang, Hae Ri (Department of Nano Engineering, Inje University)
Kim, Haeun (Department of Nano Engineering, Inje University)
Lee, Wookbin (Department of Nano Engineering, Inje University)
Leem, Jae-Young (Department of Nano Engineering, Inje University)
Publication Information
Journal of the Korean institute of surface engineering / v.47, no.4, 2014 , pp. 204-209 More about this Journal
Abstract
The electrodeposition of ZnO nanorods was performed on ITO glass. The optimization of two process parameters (solution temperature and growth time) has been studied in order to control the orientation, morphology, density, and growth rate of ZnO nanorods. The structural and optical properties of ZnO nanorods were systematically investigated by using field-emission scanning electron microscopy, X-ray diffractometer, and photoluminescence. Commonly, the results of the structural property show that hexagonal ZnO nanorods with wurtzite crystal structures have a c-axis orientation, and higher intensity for the ZnO (002) diffraction peaks. Furthermore, the nanorods length increased with increasing both the solution temperature and the growth time. The results of the optical property show a strong UV (3.28 eV) peaks and a weak visible (1.9~2.4 eV) bands, the intensity of UV peaks was increased with increasing both the solution temperature and the growth time. Especially, the UV peak for growth of nanorods at $75^{\circ}C$ blue-shift than different temperatures.
Keywords
Zinc oxide; Nanostructure; Electrodepositon; Photoluminescence; X-ray diffraction;
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1 P. Yang, H. Yan, S. Mao, R. Russo, J. Johnson, R. Saykally, Nathan, Morris, J. Pham, R. He, and H. J. Choi, Adv. Funct. Mater., 12 (2002) 323.   DOI
2 S. Fujihara, C. Sasaki, and T. Kimura, Appl. Surf. Sci., 180 (2001) 341.   DOI   ScienceOn
3 M. Ohyama ; J. Am. Ceram., 81 (1998) 1622.
4 D. Bao, H. Gu, and A. Kuang ; Thin Solid Films, 312 (1998) 37.   DOI   ScienceOn
5 E. Fortunato, P. Nunes, A. Marques, D. Costa, H. Aguas, I. Ferreira, M. E. V. Costa, M. H. Godinho, P. L. Almeida, J. P. Borges, and R. Martins ; Adv. Eng. Mater., 4 (2002) 610.   DOI
6 Z. L. Wang, X. Y. Kong, and J. M. Zuo, Phys. Rev. Lett., 90 (2003) 185502.   DOI   ScienceOn
7 H. K. Lee, M. S. Kim, and J. S. Kim, Nanotechnology, 22 (2011) 445602.   DOI   ScienceOn
8 Kenry, and C. T. Lim ; Prog. Mater Sci., 58 (2013) 705.   DOI   ScienceOn
9 X. Wang, C. J. Summers, and Z. L. Wang, Nano Lett., 4 (2004) 423.   DOI   ScienceOn
10 B. Pardhan, S. K. Batabyal, and A. J. Pal, Sol. Energy Mater. Sol. Cells, 91 (2007) 769.   DOI   ScienceOn
11 R. Konenkamp, R. C. Word, and C. Schlegel, Appl. Phys. Lett., 85 (2004) 6004.   DOI   ScienceOn
12 Q. X. Zhao, P. Klason, and M. Willander, Appl. Phys. A Mater. Sci. Process., 88 (2007) 27.   DOI   ScienceOn
13 W. I. Park, D. H. Kim, S. W. Jung, and G. C. Yi, Appl. Phys. Lett., 80 (2002) 4232.   DOI   ScienceOn
14 B. Xue, Y. Liang, L. Donglai, N. Eryong, S. Congli, f. Huanhuan, X. Jingjing, J. Yong, J. Zhifeng, and S. Xiaosong, Appl. Surf. Sci., 257 (2011) 10317.   DOI   ScienceOn
15 M. Lzaki, S. Watase, and H. Takahashi, Appl. Phys. Lett., 83 (2003) 4930.   DOI   ScienceOn
16 A. Goux, T. Pauporte, J. Chivot, and D. Lincot, Electrochim. Acta, 50 (2005) 2239.   DOI   ScienceOn
17 M. Guo, C. Yang, M. Zhang, Y. Zhang, T. Ma, X. Wang, and X. Wang, Electrochim. Acta, 53 (2008) 4633.   DOI   ScienceOn
18 L. Wu, Y. Wu, W. Lu, H. Wei, and Y. Shi, Appl. Surf. Sci., 252 (2005) 1436.   DOI   ScienceOn
19 Y. Sun, G. M. Fuge, and M. N. R. Ashfold, Chem. Phys. Lett., 396 (2004) 21.   DOI   ScienceOn
20 J. F. Chang, W. C. Lin, and M. H. Hon, Appl. Surf. Sci., 183 (2001) 18.   DOI   ScienceOn
21 M. Tolosa, L. Damonte, H. Brine, H. Bolink, and M. Fenollosa, Nanoscale Res. Lett., 8 (2013) 135.   DOI   ScienceOn
22 B. Liu, and H. C. Zeng, J. Am. Chem. Soc., 125 (2003) 4430.   DOI   ScienceOn