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http://dx.doi.org/10.5695/JKISE.2010.43.6.272

Life Time Characteristics of OLED Device with AlOx Passivation Film Deposited by RF Magnetron Sputtering  

An, O-Jin (Department of Advanced Materials Science and Engineering, Daejin University)
Ju, Sung-Hoo (Department of Advanced Materials Science and Engineering, Daejin University)
Yang, Jae-Woong (Department of Advanced Materials Science and Engineering, Daejin University)
Publication Information
Journal of the Korean institute of surface engineering / v.43, no.6, 2010 , pp. 272-277 More about this Journal
Abstract
We investigated the life time characteristics of OLED device with aluminium oxide ($AlO_x$) passivation film on glass substrate and polyethylene terephthalate (PET) substrate by RF magnetron sputtering for the transparent barrier film applied to flexible OLED device. Basic buffer layer was determined as $Alq_3$(500 nm)-LiF(300 nm)-Al(1200 nm), and the most suitable aluminium oxide ($AlO_x$) film have been formed when the partial volume ratio of oxygen was 20% and the sputtering power was 100 watt and the minimum thickness of buffer was $2\;{\mu}m$. $AlO_x$/epoxy hybrid film was also used as a effective passivation layer for the purpose of improving life time characteristics of OLED devices with the glass substrate and the plastic substrate. Besides, the simultaneous deposition of $AlO_x$/epoxy film on back side of PET could result in better improvement of life time.
Keywords
OLED; Passivation; $AlO_x$; Epoxy; Hybrid; PET; Sputtering;
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Times Cited By KSCI : 3  (Citation Analysis)
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