Temperature effect on Dry Etching of ZrO2 in Cl2/BCl3/Ar Plasma
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Yang, Xue
(School of Electrical and Electronics Engineering, Chung-Ang University)
Ha, Tae-Kyung (School of Electrical and Electronics Engineering, Chung-Ang University) Wi, Jae-Hyung (Department of Renewable Energy, Chung-Ang University) Um, Doo-Seung (School of Electrical and Electronics Engineering, Chung-Ang University) Kim, Chang-Il (School of Electrical and Electronics Engineering, Chung-Ang University) |
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