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http://dx.doi.org/10.5695/JKISE.2007.40.4.165

Characterization of Cesium Assisted Sputtering Process Using Design of Experiment  

Min, Chul-Hong (School of Information, Communications and Electronics Engineering, Catholic University of Korea)
Park, Sung-Jin (SORONA Inc.)
Yoon, Neung-Goo (SORONA Inc.)
Kim, Tae-Seon (School of Information, Communications and Electronics Engineering, Catholic University of Korea)
Publication Information
Journal of the Korean institute of surface engineering / v.40, no.4, 2007 , pp. 165-169 More about this Journal
Abstract
Compared to conventional Indium Tin Oxide (ITO) film deposition methods, cesium (Cs) assisted sputtering offers higher film characteristics in terms of electrical, mechanical and optical properties. However, it showed highly non-linear characteristics between process input factors and equipment responses. Therefore, to maximize film quality, optimization of manufacturing process is essential and process characterization is the first step for process optimization. For this, we designed 2 level design of experiment (DOE) to analyze ITO film characteristics including film thickness, resistivity and transmittance. DC power, pressure, carrier flow, Cs temperature and substrate temperature were selected for process input variables. Through statistical effect analysis methods, relation between three types of ITO film characteristics and five kinds of process inputs are successfully characterized and eventually, it can be used to optimize Cs assisted sputtering processes for various types of film deposition.
Keywords
Design of Experiment[DOE]; Cesium assisted sputtering; Indium tin oxide[ITO]; Statistical analysis;
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Times Cited By KSCI : 1  (Citation Analysis)
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