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The Characteristics of c-BN Thin Films on High Speed Steel by Electron Assisted Hot Filament C.V.D Systems  

Lee, Gun-Young (Department of Advanced Materials Science and Engineering, Dankook University)
Choe, Jean-Il (Department of Advanced Materials Science and Engineering, Dankook University)
Publication Information
Journal of the Korean institute of surface engineering / v.39, no.3, 2006 , pp. 87-92 More about this Journal
Abstract
The characteristic of interface layer and the effect of bias voltage on the microstructure of c-BN films were studied in the microwave plasma hot filament C.V.D process. c-BN films were deposited on a high speed steel(SKH-51) substrate by hot filament CVD technique assisted with a microwave plasma to develop a high performance of resistance coating tool. c-BN films were obtained at a gas pressure of 20 Torr, vias voltage of 300 V and substrate temperature of $800^{\circ}C$ in $B_2H_6-NH_3-H_2$ gas system. It was found that a thin layer of hexagonal boron nitride(h-BN) phase exists at the interface between c-BN layer and substrate.
Keywords
c-BN films; Bias voltage; Microwave plasma hot filament C.V.D Process; Resistance wear coating tool;
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