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Deposition of $(Ti,Cr)N-MoS_2$ Thin Films by D.C Magnetron Sputtering  

Kim S.K. (School of Materials Science and Engineering, University of Ulsan)
Kim J.H. (School of Materials Science and Engineering, University of Ulsan)
Publication Information
Journal of the Korean institute of surface engineering / v.39, no.2, 2006 , pp. 70-75 More about this Journal
Abstract
As technology advances, there is a demand for development of hard, solid lubricant coating. (Ti,Cr)N-$MoS_2$, films were deposited on SKD 11 tool steel substrate by co-deposition of $MoS_2$, with (Ti,Cr)N using a D.C. magnetron sputtering process. The influence of the $N_2/Ar$ gas ratio, the deposition temperature, the amount of $MoS_2$ in the films, and the bias voltage on the mechanical and the structural properties of the films were investigated. Wear tests were performed on the films deposited in various conditions.
Keywords
Soild Iubricant coating; (Ti,Cr)N-$MoS_2$ films; $MoS_2$; (Ti,Cr)N; D.C. magnetron sputtering;
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