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The Residual Stress Effect on Microstructure and Optical Property of ZnO Films Produced by RF Sputtering  

Ryu, Sang (Department of Materials Science and Engineering , Mechanical Metallurgy Laboratory, Chonnam National University)
Kim, Young-Man (Department of Materials Science and Engineering , Mechanical Metallurgy Laboratory, Chonnam National University)
Publication Information
Journal of the Korean institute of surface engineering / v.38, no.4, 2005 , pp. 144-149 More about this Journal
Abstract
ZnO films were produced on the Si(100) and sapphire(0001) wafers by RF magnetron sputtering in terms of processing variables such as substrate temperature and RF power. The stress in films was obtained from the Stoney's formula using a laser scanning device. The stress levels in the films showed the range from $\~40$ MPa to $\~-1100$MPa depending on processing variables. The specimens were thermally cycled from R.T. to $250^{\circ}C$ to investigate the stress variation as a function of temperature. SEM was employed to characterize the microstructure of te films. As the substrate temperature increased, the film surface became rougher and the films showed coarser grains. The optical property o the films was studied by PL measurements. At the highest substrate temperature $800^{\circ}C$ the film exhibited sharper UV peaks unlike other conditions.
Keywords
Stress; ZnO thin films; R.F. magnetron sputtering;
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