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Dry Etching of AlGaAs and InGaP in a Planar Inductively Coupled B$Cl_3$ Plasma  

S. J. Pearton (Department of Materials Sci. and Eng., University of Florida)
Publication Information
Journal of the Korean institute of surface engineering / v.36, no.4, 2003 , pp. 334-338 More about this Journal
Keywords
AlGaAs; InGaP; ICP; Dry etching;
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