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High Temperature Oxidation of Ti-43%Al-2%W-0.1%Si Alloys  

심웅식 (성균관대학교 금속재료공학부)
이동복 (성균관대학교 금속재료공학부)
Publication Information
Journal of the Korean institute of surface engineering / v.36, no.2, 2003 , pp. 128-134 More about this Journal
Abstract
Alloys of Ti-43%Al-2%W-0.1%Si were oxidized isothermally and cyclically between $900^{\circ}C$ and$ 1050^{\circ}C$, and their oxidation characteristics were studied. During isothermal tests, the alloys oxidized slowly up to 100$0^{\circ}C$, but fast at $1050^{\circ}C$. Though the scale adherence was not good above $900^{\circ}C$, the alloys displayed better oxidation behavior than unalloyed TiAl alloys. The oxide scales consisted primarily of an outer $TiO_2$ layer, intermediate $Al_2$$O_3$-rich layer, and an inner mixed layer of (TiO$_2$ $+Al_2$$O_3$). Tungsten was present mainly at the lower part of the oxide scale, while Si over the whole oxide scale.
Keywords
Titanium aluminide; Tungsten; Silicon; High-temperature oxidation;
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