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Characterization of Nanocomposite Ti-Si-N Films Prepared by a Hybrid Deposition System of A If and Sputtering Techniques  

윤순영 (부산대학교 공과대학 재료공학부)
최성룡 (부산대학교 공과대학 재료공학부)
이미혜 (기술신용보증기금 기술평가센터)
김광호 (부산대학교 공과대학 재료공학부)
Publication Information
Journal of the Korean institute of surface engineering / v.36, no.2, 2003 , pp. 122-127 More about this Journal
Abstract
Ti - Si - N hard films were deposited on SKD11 steel substrates by a hybrid deposition system, where TiN was deposited by AIP method while Si was incorporated by sputtering one. The microstructure of Ti-Si-N films was revealed to be a composite of TiN crystallites and amorphous Si3N4 by instrumental analyses. The highest hardness value of about 45 Gpa was obtained at the Si content of around 7.7 at.%. With increase of Si content, the size of TiN crystallites was reduced and their distribution was changed from aligned to randomly orientated states. Surface roughness of Ti-Si-N film also decreased with increase of Si content.
Keywords
Ti-Si-N; Hybrid deposition system; Superhardness;
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