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http://dx.doi.org/10.7236/JIIBC.2020.20.3.135

Development of Confined Plasma Source for Hazardous Gas Treatment  

Yoon, Yongho (School of Electrical and Electronic Engineering, Gwangju University)
Publication Information
The Journal of the Institute of Internet, Broadcasting and Communication / v.20, no.3, 2020 , pp. 135-140 More about this Journal
Abstract
Since the process gas that is essential in the semiconductor process is a harmful gas, it is an essential task to solve it in an environmentally friendly manner. Currently, the cleaning technology used in the semiconductor process is mostly a wet cleaning based on hydrogen peroxide developed in the 1970s, and the SC-1 cleaning liquid for removing particles on the surface uses a mixture of ammonia and hydrogen peroxide. Therefore, environmental problems are caused, and economic problems caused by excessive water use are also serious. For this reason, the products developed through this study are used to decompose the process harmful gas from the chamber outlet into a harmless gas before entering the vacuum pump, or by incineration and the gaseous components are deposited on the pump. I want to solve the problem. In this paper, CPS (Confined Plasma Source) is proposed to save environment and improve productivity by replacing harmful gases (N2, CF4, SF6⋯., Etc) which are indispensable in semi-contamination process with innocuous gases or incineration with plasma, to study.
Keywords
CPS (Confined Plasma Source); Harmful Gases; Power Source; Cleaning Technology;
Citations & Related Records
Times Cited By KSCI : 3  (Citation Analysis)
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1 J. R. Roth, "Industrial Plasma Engineering Applications to Nonthermal Plasma Processing", Institute of Physics, Vol. 2, pp. 37-73, 2001.
2 Schoenbach, K, Barker, R, Liu, S "Special Issue on Nonthermal Medical/Biological Treatments using Electromagnetic Fields and Ionized Gases", IEEE Transactions on Plasma Science, Vol. 28 No. 1, pp. 25, 2000.
3 S. Raoux, J. G. Langan, "Remote NF3 Chamber Clean Virtually Eliminates PFC Emission from CVD Chamber and Improves System Productivity" Semiconductor Fabtech-9th Edition.
4 N. Krishnan,R. Smate, S. aoux, D. Dornfeld "Alternatives to Reduce Perfluorinated Compound (PFC) Emissions from Semiconductor Dielectric Etch Processes: Meeting Environmental commitments while minimizing costs, Electronics and the Environment, 2003. IEEE International Symposium on, 2003.
5 B. S. Chae, J.W. Min, Y. S. Suh, and H. B. Kim, "Current Source Type Pulse Generator with Improved Output Voltage Waveform for High Voltage Capacitively Coupled Plasma System", The Transactions of Korean Institute of Power Electronics, Vol. 24, No. 3, pp. 153-160, 2019. https://doi.org/10.6113/TKPE.2019.24.3.153   DOI
6 K. C. Ho, "Nano-scale Power Splitters by using Plasmonic Multimode Interference Couplers", The Journal of The Institute of Internet, Broadcasting and Communication (JIIBC), Vol. 11, No. 4, pp. 47-52, 2011.   DOI