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http://dx.doi.org/10.5764/TCF.2009.21.5.058

Improved Antimicrobial Efficacy of m-Aramid  

Kim, Sam-Soo (School of Textiles, Yeungnam University)
Park, Jeong-Eun (School of Textiles, Yeungnam University)
Jung, Da-Un (School of Textiles, Yeungnam University)
Seo, Byeong-Joo (Department of Applied Microbiology, Yeungnam University)
Huh, Man-Woo (Department of Textile & Fashion Technology, Kyungil University)
Lee, Jae-Woong (Kolon Industries, Inc.)
Publication Information
Textile Coloration and Finishing / v.21, no.5, 2009 , pp. 58-62 More about this Journal
Abstract
Poly(m-phenyleneisophthalamide), m-aramid has no adjacent $\alpha$-hydrogen of a nitrogen-halogen bond causes dehydrohalogenation. This fact proposes that m-aramid is one of good antimicrobial precursors. To enhance the surface area of m-aramid, electrospinning was employed. Scanning electron microscopy(SEM) was conducted to inspect the morphology change of m-aramid. The surface area of regular and electrospun m-aramid was calculated. Swatch test was applied to measure antimicrobial activity of the samples. The results showed that within 10 min contact time the electrospun m-aramid inactivated Escherichia coli KCTC 1039 (Gram-negative bacteria) with 8 log reductions.
Keywords
N-halamine; antimicrobial; biocidal; electrospinning; m-aramid;
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