Abstract
The purpose of this study was to obtain the basic element of patterns, which is the motif, from the existing art works and use it to create and simulate a variety of patterns to show the practical use of the computer. Natural dyed works of geometric shapes like squares and 1/4 of circles, each dyed with a different natural dyes, were produced and motifs were extracted. Then using the 4D box in Adobe Photoshop v.6.0, the developing pattern change and simulation effects when using different patterns and different repetition settings were examined. Observations were made as the motifs were replicated. Different patterns like a diagonal line, a square and a circle appeared. In order to find out the effects according to the changes, the motifs from work's square portions, circle centre, and the composition of eight motifs were extracted and used. The repeated patterns according to the extracted motifs simply showed that in the case of just repeating and arranging, square patterns appeared. By replicating and arranging, the motif and the allophone were matched and patterns with regular lines were formed, like a twill, pointed twill line. By setting the direction to Y and X in the repetition methodes, a typical half-drop arrangement or a brick pattern arrangement were formed according to 1/4, 2/4, 3/4, 1/3, or 2/3 in changes. Also the steepness of the slope changes quickly or in turn slowly as the rhombus shape appears. However in the case of a composed motif, an ogee pattern appeared. Lastly, by 3-D mapping patterns like a slant line, pointed twill patterns, diamond patterns, and the repeat patterns of a motif with a circle and a line combined, and a circle motif, an optical illusion could be observed.
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