Improvement of Calculation Accuracy in the Electron Monte Carlo Algorithm with Optional Air Profile Measurements

Purpose: In this study, the accuracies of electron Monte Carlo (eMC) calculation algorithms were evaluated to determine whether electron beams were modeled by optional air profiles (APs) designed for each applicator size. Methods: Electron beams with the energies of 6, 9, 12, and 16 MeV for VitalBeam (Varian Medical System, Palo Alto, CA, USA) and 6, 9, 12, 16, and 20 MeV for Clinac iX (Varian Medical System) were used. Optional APs were measured at the source-to-detector distance of 95 cm with jaw openings appropriate for each machine, electron beam energy, and applicator size. The measured optional APs were postprocessed and converted into the w2CAD format. Then, the electron beams were modeled and calculated with and without optional APs. Measured profiles, percentage depth doses, penumbras with respect to each machine, and energy were compared to calculated dose distributions. Results: For VitalBeam, the profile differences between the measurement and calculation were reduced by 0.35%, 0.15%, 0.14%, and 0.38% at 6, 9, 12, and 16 MeV, respectively, when the beams were modeled with APs. For Clinac iX, the differences were decreased by 0.16%, -0.31%, 0.94%, 0.42%, and 0.74%, at 6, 9, 12, 16, and 20 MeV, respectively, with the insertion of APs. Of note, no significant improvements in penumbra and percentage depth dose were observed, although the beam models were configured with APs. Conclusions: The accuracy of the eMC calculation can be improved in profiles when electron beams are modeled with optional APs.