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Hyunseop Lee, David Alan Dornfeld, and Haedo Jeong, "Mathematical model-based evaluation methodology for environmental burden of chemical mechanical planarization process", International Journal of Precision Engineering and Manufacturing-Green Technology, Vol. 1, Issue 1, pp. 11-15, 2014.
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Changsuk Lee, Jaehong Park, Masaharu Kinoshita, and Haedo Jeong, "Analysis of pressure distribution and verification of pressure signal by changes load and velocity in chemical mechanical polishing", International Journal of Precision Engineering and Manufacturing, Vol. 16, Issue 6, pp. 1061-1066, 2015.
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Changsuk Lee, Jaehong Park, Masaharu Kinoshita, and Haedo Jeong, "Development of intelligent pad monitoring system and application to analysis of pressure distribution in chemical mechanical polishing process", International Journal of Precision Engineering and Manufacturing, Vol. 15, Issue 9, pp. 2005-2009, 2014.
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Hyunseop Lee1, Hojun Lee, Hobin Jeong, Sungha Choi, Youngkyun Lee, "Macroscopic and Microscopic Investigation on Chemical Mechanical Polishing of Sapphire Wafer", Journal of Nanoscience and Nanotechnology, Vol. 12, pp. 1256-1259, 2012.
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Hong Lei, Kaiyu Tong, Zhanyong Wang, "Preparation of Ce-doped colloidal composite abrasives and their chemical mechanical polishing behavior on sapphire substrates", Materials Chemistry and Physics, Vol. 172, pp. 26-31, 2016.
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