Browse > Article
http://dx.doi.org/10.9725/kstle.2009.25.2.086

Effect of Temperature on the Micro-scale Adhesion Behavior of Thermoplastic Polymer Film  

Kim, Kwang-Seop (Nano-Mechanical systems Research Division, KIMM)
Heo, Jung-Chul (School of Mechanical, Aerospace & Systems Engineering, KAIST)
Kim, Kyung-Woong (School of Mechanical, Aerospace & Systems Engineering, KAIST)
Publication Information
Tribology and Lubricants / v.25, no.2, 2009 , pp. 86-95 More about this Journal
Abstract
Adhesion tests were carried out in order to investigate the effect of temperature on the adhesion behavior between a PMMA film and a fused silica lens in the micro scale. For the tests, a microtribometer system was specially designed and constructed. The pull-off forces on the PMMA film were measured under atmospheric condition as the temperature of the PMMA film was increased from 300 K to 443 K and decreased to 300 K. The contact area between the PMMA film and the lens was observed during the test. The adhesion behavior was changed with the change of the PMMA surface state as the temperature increased. In glassy state below 363 K, the pull-off force did not change with the increase of temperature. In rubbery state from 383 K to 413 K, the pull-off force increased greatly as the temperature increased. In addition, the area of contact was enlarged. In viscous state above 423 K, the fingering instability was observed in the area of contact when the PMMA film contacted with the lens. It was also found that the adhesion behavior can be varied with the thermal history of the PMMA film. The residual solvent in the PMMA film could emerge to the PMMA surface due to the heating and reduced the pull-off force.
Keywords
adhesion; thermoplastic polymer film; thermal effect; microtribometer;
Citations & Related Records
연도 인용수 순위
  • Reference
1 Chou, S.Y., Krauss, P.R. and Renstrom, P.J., 'Nanoimprint lithography,' Joumal of Vacuum Science and Technology B, Vol. 14, No. 6, pp. 4129-4133, 1996   DOI   ScienceOn
2 Chou, S.Y., Krauss, P.R., Zhang, W., Guo, L.J. and Zhuang, L., 'Sub-lO nm imprint lithography and applicatíons,' Joumal of Vacuum Science and Technology B, Vol. 15, pp. 2897-2904, 1997   DOI   ScienceOn
3 Bhushan, B., and Burton, Z., 'Adhesion and friction properties of polymεrs in microf1uidic dεvices,' Nanotechnology, Vol. 16, pp. 467-478, 2005   DOI   ScienceOn
4 Callister, W.D., Material science and engineering: an introduction, 5th edition, John Wiley & Sons, Inc., 2000, pp. 791-796
5 Saftìnan, P.G., and Taylor, G., 'The penetration of a fluid into a porous medium or Hele-Shaw cell containing a more viscous Iiquid,' Proceedings of the Royal Society of London, Series A, Mathematical and Physical Sciences, Vol. 245, No. 1242, pp. 312-329, 1958   DOI
6 Zeng, H., Tian, Y., Zhao, B., Tirrell, M., and Israelachvili, J., 'Transient surface pattems and instabilities at adhesive junctions of viscoelastic films,' Langmuir, Vol. 23, pp. 6126-6135, 2007   DOI   ScienceOn
7 Chou, S.Y., Krauss, P.R. and Renstrom, P.J., 'lmprint of sub-25nm vias and trenches in polymers,' Applied Physics Lettcrs, Vol. 67, No. 21, pp. 3114-3116, 1995   DOI   ScienceOn
8 Chao, C. and Guo, L.J., 'Polymer microring resonators fabricated by nanoimprint technique,' Joumal of Vacuum Science and Technology B, Vol. 20, No. 6, pp.2862-2866, 2002   DOI   ScienceOn
9 Hammerschmidt, J.A., Gladfelter, W. L., and Haugstad, G., 'Probíng polymer viscoelastic relaxations with tεmperature-controlled friction force microscopy,' Macromolecules, Vol. 32, No. 10, pp.3360-3367, 1999   DOI   ScienceOn
10 Chεng, x., Hong, Y.T., Kanicki, J., and Guo, L.J., 'High-resolution organic polymer light-emitting pixels fabricated by imprinting technique,' Journal of Vacuum Science and Technology B, Vol. 20, No. 6, pp. 2877-2880, 2002   DOI   ScienceOn
11 Park, S. G., Schift, H., Padeste, c., Schnyder, B., Kotz, R., and Gobrecht, Jens., ' Anti-adhcsivε layers on nickel stamps for nanoimprint lithography,' Microelectronic Engineering, Vol. 73-74, pp. 196-201, 2004   DOI   ScienceOn
12 Jung, GY., Li, Z., Wu, W., Chen, Y., Olynick, D.L., Wang, S.Y., Tong, W.M., and Williams, R.S., 'Vapor-phase self-assemblcd monolayer for improved mold release in nanoimprint Iithography,' Langmuir, Vol. 21. pp. 1158-1161, 2005   DOI   ScienceOn
13 Bistac, S., and Schultz, J., 'Study of soIution-cast films of PMMA by dielectric spectroscopy: influence of the nature of the solvent on a and b relaxations,' lnternational Journal of Adhesion and Adhesives, Vol. 17, No. 3, pp. 197-201, 1997   DOI   ScienceOn
14 Jaszewski, R. w., Schift, H., Groning, P., and Margaritondo, G, 'Properties of thin anti-adhesive films used for the replication of microstructures in polymers,' Microelectronic Engineering, Vol. 45, No. 1-4, pp. 381-384, 1997
15 Christenson, H.K., 'Adhesion betwcen surfacesn undersaturated vapors-a reexamination of 'the influence ofmeniscus curvature and surface forces,' Journal of Colloid and Interface Science, Vol.121, No.1 , pp. 170-178, 1988   DOI   ScienceOn
16 Bailey, T., Choi, B.J., Colbum, M., Meissl, M., Shaya, S., Ekerdt, J.G, Sreenivasan, S.V., and WiIlson, C. G, 'Step and flash imprint lithography: Template surface treatment and defect analysis,' Joumal of Vacuum Science and Technology B, Vol. 18, No. 6, pp. 3572-3577, 2000   DOI   ScienceOn
17 Zeng, H., Tian, Y., Zhao, B., Tirrell, M., and Israelachvili, J., 'Transient interfacial pattems and instabilities associated with liquid film adhesion and spreading,' Langmuir, Vol. 23, pp. 6126-6135, 2007   DOI   ScienceOn
18 Tambe, N. S., and Bhushan, B., 'Micro/nanotribological characterization of POMS and PMMA used for BioMEMSINEMS applications,' Ultramicroscopy, Vol. 105, pp. 238-247, 2005   DOI   ScienceOn
19 Choi, D.G., Jeong, J.H., Sim, Y.S., Lee, E.S., Kim, W.S., and Bae, B.S., ' Fluorinated organic-inorganie hybrid mold as a new stamp for nanoimprínt and 50ft Iithography,' Langmuir, Vol. 21, No. 21 , pp. 9390-9392, 2005   DOI   ScienceOn
20 Mary, P., Chateauminois, A., and Fretigny, C., 'Deformation of elastic coatings in adhesive contacts with spherical probes,' Journal of Physics D: Applied Physics, Vol. 39, pp. 3665-3673, 2006   DOI   ScienceOn
21 Wei, G., Bhushan, B., Fe1Tell, N., and Hansford, D., 'Microfabrication and nanomechanical characterization of polymer microelectromechanical system for biological app\i cations,' Joumal of Vacumn Science and Technology B, Vol. 23, No. 4, pp. 811-819, 2005
22 Kao, P.C., Chu, S.Y., Chen, T.Y., Zhan, C.Y., Hong, F.C., Chang, c.Y., Hsu, L.C., Liao, W.C., and Hon, M.H., 'Fabrication of large-scaled organic light emitting devices on the flexible substrates using 10wpressure imprinting Iithography,' IEEE Transactions on Electrical Devices, Vol. 52, No. 8, pp. 1722-1726, 2005   DOI   ScienceOn
23 Chen, J. K., Ko, F. H., Hsieh, K. F., Chou, C. T., and Chang, F. C., 'Effect of fluoroalkyl substítuents on thc rcactions of alkylchlorosilanes with mold surfaces for nanoimprint lithography,' Joumal of Vacuum Scíence and Technology B, Vol. 22, No. 6, pp. 3233-3241 , 2004   DOI   ScienceOn
24 Ahn S W, Lee K D, Kim J S, Kim S H, Park J D, Lee S H and Yoon P W, ' Fabrication of a 50 nm half-pitch wire grid polarizer using nanoimprint Iithography,' Nanotechnology, Vol. 16, No. 9, pp. 1874-1877, 2005   DOI   ScienceOn
25 Austin, M.D., Ge, H., Wu, W., Li, M., Yu, Z., Wasserman, D., Lyon, S.A. and Chou, S.Y., 'Fabrication of 5 nm linewidth and 14 nm pitch features by nanoimprint lithography,' Applied Physics Letters, Vol. 84, No. 26, pp‘ 5299-5301, 2004   DOI   ScienceOn
26 Sigma-Aldrich hompage, www.sigma-aldrich.com
27 Kim, K.S., Heo, J.C., and Kim, K.W., 'Effect of temperature on the friction behavior of thermoplas-tic polymer film,' in preparation
28 Hirai, Y., Yoshida, S., Takagi, N., Tanaka, Y., Yabe, H., Sasaki, K., Sumitani, H., and Yamamoto, K., 'High Aspect Pattem Fabrication by Nano Imprint Lithography Using Fine Diamond Mold,' Japanese Joumal of Applied Physics Part 1, Vol. 42, pp. 3863-3866, 2003   DOI
29 Beck, M., Graczyk, M., Maximov. I., Sarwe, E. L., T. G. I. Ling, Keil, M., and Montelius, L., 'Improving stamps for 10 nm level wafer scale nanoimprint lithography,' Microelectronic Engineering, Vol. 61-62, pp. 441-448, 2002   DOI   ScienceOn
30 Kim, K.S, Ando, Y., and Kim, K.W., 'The effect of temperature on thc nano-scale adhesion and fríetion behaviors of thennoplastíe polymer films,' Nanotechnology, Vol. 19, pp. 105701, 2008   DOI   ScienceOn
31 Luengo, G., Pan, J., Heuberger, M., and Israclach vili, J.N., 'Temperatmε and time effects on the adhesion dynamics of poly(butyl mεthacrylate) (PBMA) surfaces,' Langmuir, Vol. 14, No. 14. pp.3873-3881, 1998   DOI   ScienceOn
32 Pocius, A.Y.: Adhesion and Adhesives Technology: An Introduction, Hanser/Cardner Publications, Inc., New York (1997)
33 Kim, K.S., Kang, J.H., and Kim, K.W., 'Adhesion characteristics between mold and thennoplastic polymer film in thennal nanoimprint lithography,' Tribology Letters, submitted, 2008
34 Wang, X.P., Tsui, O.K.C., and Xiao, X., 'Oynamic study of polymer films by frictíon torce microscopy with continuously varying load,' Langmuir, Vol. 18, pp. 7066-7072, 2002   DOI   ScienceOn
35 Arakcheeva, E.M., Tanklevskaya, E.M., Nesterov, S.I., Maksimov, M.Y., Gurevich, and S.A., Seekamp, J., Torres, C.M.S., 'Fabrication of semiconductorand polymer-based photonic crystals using nanoimprint lithography,' Technical Physics, Vol. 50, no. 8, pp. 1043-1047, 2005   DOI   ScienceOn
36 Kang, J.JT., Kim, K.S., and Kim, K.W., 'Molccular dynamics study of pattem transfer in nanoimprint lithography,' Tribology Letters, Vol. 25, No. 2, pp. 93-102, 2007   DOI   ScienceOn
37 Tambe, N.S., and Bhushan, B., 'Durability studies of micro/nanoeleetromechanical systems materials, coatings and lubricants at high sliding velocities (up to 10 mm/s) using a modified atomic force microscope,' Joumal of Vacuum Science and Technology B, Vol. 23, No. 4, pp. 830-835, 2005   DOI   ScienceOn
38 Zhang, W. and Chou, S.Y., 'Fabrication of 60-nm transistors on 4-in. wafer using nanoimprint at all lithography levels,' Applied Physics Letters, Vol. 83, No. 8, pp. 1632-1634, 2003   DOI   ScienceOn
39 Zeng, H., Maeda, N., Chen, N., Tirrell, M., and Israelachvili, J., 'Adhesion and friction of polystyrene surfaces around $T_g$,' Macromolecules, Vol. 39, pp. 2350-2363, 2006   DOI   ScienceOn
40 Tsui, O.K.C, Wang, X.P., Ho, J.Y.L., Ng, T.K., and Xiao, X., 'Studying surface glass-to-rubber transition using atomic force microscopic adhesion measurements,' Macromolecules, Vol. 33, pp. 4198-4204, 2000   DOI   ScienceOn
41 Tambe, N.S., and ßhushan, B., 'Scalc dependence of micro/nano-friction and adhesion of MEMSINEMS materials, coatings and lubricants,' Nanotechnology, Vol. 15, pp. 1561-1570, 2004   DOI   ScienceOn
42 Schift, H., Saxer, S., Park, S. G, Padeste, C., Pieles, U., and Gobrecht, J., 'Controlled co-evaporation of silanes for nanoimprint stamps,' Nanotechnology, Vol. 16, pp. S171-S175, 2005   DOI   ScienceOn
43 Hirai, Y., Yoshida, S., and Takagi, N., 'Defect analysis in thermal nanoimprint lithography,' Journal of Vacuum Science and Technology B, Vol. 21, No. 6, pp. 2765-2770, 2003   DOI   ScienceOn