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http://dx.doi.org/10.9725/kstle.2008.24.6.326

Study on the Enhancement of the Uniform Contact Technology for Large Scale Imprinting with the Design of Vacuum Gripping Pad  

Jang, Si-Youl (School of Mechanical and Automotive Engineering Kookmin University)
Publication Information
Tribology and Lubricants / v.24, no.6, 2008 , pp. 326-331 More about this Journal
Abstract
The contact surfaces between mold and target should be in parallel for a proper imprinting process. However, large size of contacting area makes it difficult for both mating surfaces (mold and target planes) to be in all uniform contact with the expected precision level in terms of thickness and position. This is caused by the waviness of mold and target although it is very small relative to the area scale. The gripping force for both mold and target by the vacuum chuck is other major effect to interrupt the uniform contact, which must be avoided in imprinting mechanism. In this study, the cause of non-conformal contact mechanism between mold and target is investigated with the consideration of deformation due to the vacuum gripping for the size $470{\times}370\;mm^2$ LCD panel.
Keywords
contacting surfaces; vacuum chuck; parallel contact mechanism; squeeze film effect; gap control; Reynolds equation; imprinting;
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1 Heyderman, L. J., Schift, H., David, C., Gobrecht, J. and Schweizer, T., 'Flow Behavior of Thin Polymer Films used for Hot Embossing Lithography', Microelectronic Engineering, Vol. 54, pp. 229-245, 2000   DOI   ScienceOn
2 Guo, L. J., 'Recent Progress in Nanoimprint Technology and Its Applications', J. Phys. D:Appl. Phys., Vol. 37, R123-141, 2004   DOI   ScienceOn
3 Schift, H., Bellini, S. and Gobrecht, J., 'Visualization of Mold Filling Stages in Thermal Nanoimprint by Using Pressure Gradients', J. Vac. Sci. Technol. B, Vol. 25, No. 6, pp. 2312-2316, 2006
4 Hamrock, B. J., Fundamentals of Fluid Film Lubrication, McGraw-Hill, ISBN 0-07-025956-9
5 Landis, S., Chaix, N., Gourgon, C., Perret, C. and Leveder, T., 'Stamp Design Effect on 100 nm Feature Size for 8 inch Nanoimprint Lithography', Nanotechnlogy, Vol. 17, pp. 2701-2709, 2006   DOI   ScienceOn