1 |
S. Y. Chou, P. R. Krauss and P. J. Renstrom, 'Imprint of sub-25 nm vias and trenches in polymers,' Appl. Phys. Lett., Vol .67, No. 20, pp. 3114-3116, 1995
DOI
ScienceOn
|
2 |
Y. Hirai, S. Yoshida, N. Takagi, Y.Tanaka, H. Yabe, K. Sasaki, H. Sumitani and K. Yamamoto, 'Hgih aspect pattern fabrication by nanoimprint lithography using fine diamond mold,' Jpn. J. Appl. Phys., Vol. 42, pp. 3863-3866, 2003
DOI
|
3 |
C. Martin, L. Ressier and J. P. Peyrade, 'Study of PMMA recoveries on micrometric patterns replicated by nano-imprint lithography,' Physica E, Vol. 17, pp. 523-525, 2003
DOI
ScienceOn
|
4 |
Y. Hirai, S. Yoshida and N. Takagi, 'Defect analysis in thermal nanoimprint lithography,' J Vac. Sci. Technol. B, Vol. 20, No. 6, pp. 2765-2770, 2003
|
5 |
R. Komanduri, N. Chandrasekaran and L. M. Raff, 'Molecular dynamics simulation of atomic-scale friction,' Phys. Rev. B, Vol. 61, No. 20, pp. 14007-14019, 2000
DOI
ScienceOn
|
6 |
J. H. Kang, K. S. Kim and K. W. Kim, 'Molecular dynamics study of pattern transfer in nanoimprint lithography,' Tribo. Lett., in press, 2006
|
7 |
B. P. Feuston and S. H. Garofalini, 'Topological and bonding defects in vitreous silica surfaces,' J. Chem, Phys., Vol. 91, No. 1, pp. 564-570, 1989
DOI
|
8 |
Z. N. Yu and S. Y. Chou, 'Triangular profile imprint molds in nanograting fabrication,' Nano Lett., Vol. 4, No. 2, pp. 341-344, 2004
DOI
ScienceOn
|
9 |
Q. C. Hsu, C. D. Wu and T. H. Fang, 'Deformation mechanism and Punch taper effects on nanoimprint process by molecular dynamics,' Jpn. J. of Appl. Phys., Vol.43, No. 11A, pp. 7665-7669, 2004
DOI
|
10 |
W. L. Jorgensen, D. S. Maxwell and J. Tiroda-Rives, 'Development and testing of the OPLS all-atom force field on conformational energetics and proper ties of organic liquids,' J. Am. Chem. Soc., Vol. 118, pp. 11225-11236, 1996
DOI
ScienceOn
|
11 |
N. C. Ekdawi-Sever, P. B. Conrad and J. J. de Pablo, 'Molecular simulation of sucrose solutions near the glass transition temperature,' J. Phys. Chem. A, Vol. 105, pp.734-742, 2001
DOI
ScienceOn
|
12 |
M. D. Austin, H. Ge, W. Wu, M. Li, Z. Yu, D. Wasserman, S. A. Lyon and S. Y. Chou, 'Fabrication of 5 nm linewidth and 14 nm pitch features by nanoimprint lithography,' Appl. Phys. Lett., Vol. 84, No. 26, pp. 5299-5301, 2004
DOI
ScienceOn
|
13 |
W. B. Young, 'Analysis of the nanoimprint lithography with a viscous model,' Microelectronic. Eng., Vol. 77, pp. 405-411, 2005
DOI
ScienceOn
|
14 |
G L. W. Cross, B. S. O'Connel and J. B. Pethica, 'Influence of elastic strains on the mask ratio in glassy polymer nanoimprint,' Appl. Phys. Lett., Vol. 86, 081902, 2004
DOI
ScienceOn
|
15 |
B. W. H. van Beest, G. J. Kramer and R. A. van Santen, 'Force fields for silicas and aluminophosphates based on ab initio calculations,' Phys. Rev. Lett., Vol. 64, No. 16, pp. 1955-1958, 1990
DOI
ScienceOn
|
16 |
J. H. Kang, K. S. Kim and K. W. Kim, 'Molecular dynamics study on adhesion between PMMA and bare coated with alkylsilane self-assembled mono layers,' J. Korean Soc. Mech. Eng A, submitted, 2005
|
17 |
D. S. Macintyre and S. Thoms, 'A study of resist flow during nanoimprint lithography,' Microelectronic Eng., Vol. 78-79, pp. 670-675, 2005
DOI
|
18 |
E. K. Watkins and W. L. Jorgensen, 'Perfluoroalkanes: Conformational analysis and liquid-state properties from ab ignition and Monte Carlo calculations,' J. Chem. Phys. A, Vol. 105, No. 16, pp. 4118-4125, 2001
DOI
ScienceOn
|
19 |
H. C. Scheer and H. Schulz, 'A contribution to the flow behaviour of thin polymer films during hot embossing lithography,' Microelectronic Eng., Vol. 54, pp. 311-332, 2001
|
20 |
M. Colburn, S. Johnson, M. Stewart, S. Damle, T. Bailey, B. Choi, M. Wedlake, T. Michaelson, S. V. Sreenivasan, J. Ekerdt and C. G. Wilson, In SPIE's 24th Int. Symposium on Microlithography: Emerging Lithographic Technologies III, Santa Clara, CA, Vol. 3676(1), pp. 379, 1999
|
21 |
S. Y. Chou, P. R. Krauss and P. J. Renstrom, 'Nanoimprint lithography,' J. Vac. Sci. Technol. B, Vol. 14, No. 6, pp. 4129-4133, 1996
DOI
ScienceOn
|
22 |
S. J. Plimpton, 'Fast parallel algorithms for shortrange molecular dynamics,' J. Comput. Phys., Vol. 117, No. 1, pp. 1-19, 1995
DOI
ScienceOn
|
23 |
D. Rigby and R. J. Roe, 'Molecular dynamics simulation of polymer liquid and glass. I. Glass transition,' J. Chem. Phys., Vol. 87, 7285-7292, 1987
DOI
|
24 |
Y. Hirai, T. Konishi, T. Yoshikawa and S. Yoshida, 'Simulation and experimental study of polymer deformation in nanoimprint lithography,' J. Vac. Sci. Technol. B, Vol. 22, No. 6, pp. 3288-3293, 2004
DOI
ScienceOn
|
25 |
I. Szlufarska, R. K. Kalia, A. Nakano and P. Vashishta, 'Nanoindentation-induced amorphization in silicon carbide,' Appl. Phys. Lett., Vol. 85, No. 2, pp. 378-380, 2004
DOI
ScienceOn
|
26 |
C. D. Lorenz, E. B. Webb III, M. J. Stevens, M. Chandross and G. S. Grest, 'Frictional dynamics of perfluorinated self-assembled monolayers on amorphous Tribo. Lett., Vol. 19, No. 2, pp.93-99, 2005
DOI
|
27 |
W. F. van Gunsteren, S. R. Billeter, A. A. Eising, P. H. Hunenberger, P. Kruger, A. E. Mark, W. R. P. Scott and I. G Tironi, 'Biomolecular simulation: The GROMOS96 manual and user guide,' Zurich, Switzerland: Hochschulverlag AG and der ETH zurich, 1996
|
28 |
Q. C. Hsu, C. D. Wu and T. H. Fang, 'Studies on nanoimprint process parameters of copper by molecular dynamics analysis,' Comp. Mater. Sci., Vol. 34, pp. 314-322, 2005
DOI
ScienceOn
|
29 |
A. Soldera and N. Metatla, 'Study of the glass transition temperature of stereoregular PMMAs using different force fields,' Internet Elec. J. Mol. Design, Vol. 4, pp. 721-736, 2005
|
30 |
S. Bair, C. McCabe and P. T. Cummings, 'Comparison of nonequilibrium molecular dynamics with experimental measurements in the nonlinear shearthinning regime,' Phys. Rev. Lett., Vol. 88, No. 5, 058302., 2002
DOI
ScienceOn
|
31 |
S. Mukhopadhyay, P. V. Sushko, A. M. Stoneham and A. L. Shluger, 'Modeling of the structure and properties of oxygen vacancies in amorphous silica,' Phys. Rev. B, Vol. 70, Article No. 195203, 2004
|