Browse > Article
http://dx.doi.org/10.12656/jksht.2016.29.2.62

Influence of Deposition Rate on the Optoelectrical Properties of TIO Thin Films  

Moon, Hyun-Joo (School of Materials Science and Engineering, University of Ulsan)
Kim, Daeil (School of Materials Science and Engineering, University of Ulsan)
Publication Information
Journal of the Korean Society for Heat Treatment / v.29, no.2, 2016 , pp. 62-65 More about this Journal
Abstract
TIO thin films were deposited on the poly-carbonate substrates with RF magnetron sputtering under different sputtering power condition to investigate the influence of deposition rate on the electrical and optical properties of the films. Although, all films have the similar carrier concentration, the films prepared at a lower deposition rate of 4 nm/min show a higher mobility of $5.96cm^2\;V^{-1}S^{-1}$ due to the low surface roughness. In addition, optical transmittance is also influenced by a deposition rate. Based on the figure of merit, it can be concluded that the lower deposition rate effectively enhances the opto-electrical performance of IGZO films for use as transparent conducting oxides in flexible display applications.
Keywords
IGZO; magnetron sputtering; deposition rate; figure of merit;
Citations & Related Records
Times Cited By KSCI : 3  (Citation Analysis)
연도 인용수 순위
1 S. H. Kim and D. Kim : Ceram. Int. 41 (2015) 2770.   DOI
2 S. K. Kim and D. Kim : J. Kor. Soc. Heat Treat. 27 (2014) 225.   DOI
3 S. Venkatachalam, Y. Iida and Y. Kanno : Superlattices and Microstructures 44 (2008) 127.   DOI
4 A. Chaoumead, B. H. Joo, D. J. Kwak and Y. M. Sung : Appl. Surf. Sci. 275 (2013) 227.   DOI
5 G. Haacke : J. Appl. Phys. 47 (1976) 4086.   DOI
6 J. Jeon, T. K. Gong, Y. M. Kong, H. M. Lee and D Kim : Electron. Mater. Lett. 11 (2015) 481.   DOI
7 H. J. Moon and D. Kim : J. Kor. Soc. Heat Treat. 28 (2015) 291.   DOI
8 P. Prepelita, V. Craciun, F. Garoi and A. Stacu : Appl. Surf. Sci. 352 (2015) 23.   DOI
9 J. Tanc : Amorphous and Liquid Semiconductor, Plenum, New York, 1974.