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http://dx.doi.org/10.12656/jksht.2015.28.6.310

Influence of Electron Irradiation on the Structural Electrical and Optical Properties of ITO/Ti bi-layered Films  

Moon, Hyun-Joo (School of Materials Science and Engineering, University of Ulsan)
Jeon, Jae-Hyun (Dongkook Ind. Co., Ltd.)
Song, Young-Hwan (School of Materials Science and Engineering, University of Ulsan)
Oh, Jung-Hyun (School of Materials Science and Engineering, University of Ulsan)
Gong, Tae-Kyung (School of Materials Science and Engineering, University of Ulsan)
Choi, Dong-Hyuk (Dongkook Ind. Co., Ltd.)
Son, Dong-Il (Dongkook Ind. Co., Ltd.)
Kim, Daeil (School of Materials Science and Engineering, University of Ulsan)
Publication Information
Journal of the Korean Society for Heat Treatment / v.28, no.6, 2015 , pp. 310-314 More about this Journal
Abstract
We have considered the influence of electron irradiation on the optical and electrical properties of $In_2O_3/Ti$ bi-layered films prepared with RF and DC magnetron sputtering. The $In_2O_3/Ti$ thin films irradiated at 600 eV shows the lowest resistivity of $6.9{\times}10^{-4}{\Omega}cm$. The optical transmittance in a visible wave length region also influenced with the electron irradiation energy. The film that electron irradiated at 600 eV shows 82.9% of optical transmittance in this study. By comparison of figure of merit, it is concluded that the opto-electrical performance of $In_2O_3/Ti$ bi-layered film is improved with electron irradiation.
Keywords
$In_2O_3$; Ti; Magentron sputtering; Electron irradiation; Figure of Merit;
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