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http://dx.doi.org/10.12656/jksht.2012.25.3.134

Effect of Electron Irradiation Energy on the Properties of In2O3 Thin Films  

Heo, Sung-Bo (School of Materials Science and Engineering, University of Ulsan)
Chun, Joo-Yong (School of Materials Science and Engineering, University of Ulsan)
Lee, Young-Jin (School of Materials Science and Engineering, University of Ulsan)
Lee, Hak-Min (School of Materials Science and Engineering, University of Ulsan)
Kim, Daeil (School of Materials Science and Engineering, University of Ulsan)
Publication Information
Journal of the Korean Society for Heat Treatment / v.25, no.3, 2012 , pp. 134-137 More about this Journal
Abstract
We have considered the effect of electron irradiation energy of 300, 600 and 900 eV on structural, electrical and optical properties of $In_2O_3$ films prepared with RF magnetron sputtering. In this study, the thin film crystallization, optical transmittance and sheet resistance are dependent on the electron's irradiation energy. The electron irradiated $In_2O_3$ films at 900 eV are grown as a hexagonal wurtzite phase. The sheet resistance decreases with a increase in electron irradiation energy and $In_2O_3$ film irradiated at 900 eV shows the lowest sheet resistance of $110{\Omega}/{\Box}$. The optical transmittance of $In_2O_3$ films in a visible wave length region also depends on the electron irradiation energy. The film that at 900 eV shows the higher figure of merit than another films prepared in this study.
Keywords
$In_2O_3$; Magnetron sputter; Electron irradiation; XRD; AFM;
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Times Cited By KSCI : 5  (Citation Analysis)
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1 S. B. Heo, H. M. Lee, C. W. Jung, S. K. Kim, Y. J. Lee, Y. S. Kim, Y. Z. You and D. Kim : J. Kor. Soc. Heat treat, 24 (2011) 31.
2 Z. You and J. Dong : Microelectrode J, 38 (2007) 108.   DOI   ScienceOn
3 U. Betz, M. Olsson, J. Martly and M. Escola : Surf. Coat. Technol, 200 (2006) 5751.   DOI
4 K. Maki, N. Komiya and A. Suzuki : Thin Solid Films, 445 (2003) 224.   DOI
5 A. Nakaruk, D. Ragazzon and C.C. Sorrell : J. Analytical and Applied Pyrolysis 88 (2010) 98.   DOI
6 J. H. Kwak and S. H. Cho : J. Korean Vacuum Soc, 19 (2010) 224.   DOI
7 F. O. Adurodija, L. Semple and R. Bruning : Thin Solid Films, 492 (2005) 153.   DOI
8 V. Korobov, M. Leibovitch and Y. Shapira : Appl. Phys. Lett, 65 (1994) 2290.   DOI
9 V. Senthilkumar and P. Vickraman : Curr. Appl. Phys, 10 (2010) 880.   DOI
10 H. Morikawa and M. Fujita : Thin Solid Films, 359 (2000) 61.   DOI   ScienceOn
11 D. Kim : J. Kor. Soc. Heat treat, 24 (2011) 199.
12 K. Shimakawa and T. Itoh : Jpn. J. Appl. Phys, 46 (2007) 24.   DOI
13 S. B. Heo, Y. J. Lee, H. M. Lee, S. K. Kim, Y. S. Kim, Y. M. Kong and D. Kim, J. Kor. Soc. Heat treat, 24 (2011) 338.
14 G. Haacke : J. Appl. Phys, 47 (1976) 4086.   DOI   ScienceOn
15 D. Kim : Appl. Surf. Sci, 257 (2010) 704.   DOI