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http://dx.doi.org/10.12656/jksht.2012.25.1.001

A Study on the Discharge Characteristics of Cylindrical Sputtering Apparatus and Microstructure  

Oh, Chang-Sup (Korea Institute of Science and Technology Information)
Han, Chang-Suk (Dept. of Defense Science & Technology, Hoseo University)
Publication Information
Journal of the Korean Society for Heat Treatment / v.25, no.1, 2012 , pp. 1-5 More about this Journal
Abstract
The purpose of this study is to prepare a high strength fiberglass reinforced metal. Aluminum covering was carried out over carbon materials such as carbon fiber in order to increase their wettability to molten metals such as aluminum. A sputtering apparatus with a cylindrical target was fabricated to carry out the covering. Sputtering was caused by glow discharge between the target and the two anode plates attached to its top and bottom. As the substrate for preliminary test, a thin carbon wire was used instead of carbon fiber, and the wire was placed at the central axis of the target. Aluminium coating was formed on the whole surface of the substrate. The formation rate and structure of coating were varied by controlling the electrical potential of substrate. When the substrate was electrically isolated, coating with columnar structure was formed with a formation rate of $15{\mu}m/hr$. In case of grounded substrate, coating with amorphous structure was formed with a formation rate of $7{\mu}m/hr$.
Keywords
sputtering; coating; aluminum; columnar structure; amorphous structure;
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