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http://dx.doi.org/10.12656/jksht.2010.23.2.083

Thermal Stability of Silicon-containing Diamond-like Carbon Film  

Kim, Sang-Gweon (Surface Technology and Heat Treatment R&D Department, Korea Institute of Industrial Technology (KITECH))
Kim, Sung-Wan (Surface Technology and Heat Treatment R&D Department, Korea Institute of Industrial Technology (KITECH))
Publication Information
Journal of the Korean Society for Heat Treatment / v.23, no.2, 2010 , pp. 83-89 More about this Journal
Abstract
Diamond-like carbon (DLC) coating was studied to be a good tribological problem-solver due to its low friction characteristics and high hardness. However, generally hydrogenated DLC film has shown a weak thermal stability above $300^{\circ}C$. However, the silicon doping DLC process by DC pulse plasma enhanced chemical vapor deposition (PECVD) for the new DLC coating which has a good characterization with thermal stability at high temperature itself has been observed. And we were discussed a process for optimizing silicon content to promote a good thermal stability using various tetramethylsilane (TMS) and methane gas at high-temperature. The chemical compositions of silicon-containing DLC film was analyzed using X-ray photoelectron spectroscopy (XPS) before and after heat treatment. Raman spectrum analysis showed the changed structure on the surface after the high-temperature exposure testing. In particular, the hardness of silicon-containing DLC film showed different values before and after the annealing treatment.
Keywords
Silicon-containing DLC; Thermal stability; High-temperature endurance; PECVD; Graphitization; Tetramethylsilane (TMS);
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