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http://dx.doi.org/10.6117/kmeps.2018.25.2.019

Ultra-thin aluminum thin films deposited by DC magnetron sputtering for the applications in flexible transparent electrodes  

Kim, Daekyun (School of Advanced Materials Engineering, Dong-Eui University)
Choi, Dooho (School of Advanced Materials Engineering, Dong-Eui University)
Publication Information
Journal of the Microelectronics and Packaging Society / v.25, no.2, 2018 , pp. 19-23 More about this Journal
Abstract
In this study, the feasibility of Al-based transparent electrodes for optoelectronic devices was investigated. Al thin films having thickness in the range of 3-12 nm were deposited on glass substrates, and sheet resistance was measured for films thicker than 7 nm and the values continue to decrease with increasing film thickness. The grain size in the films was found to increase with increasing grain size. 85% visible light transmittance was measured at the thickness of 3 nm, and decreased to 50% and 60% when the film thickness reaches 4 nm and 5 nm, respectively. The results of this study can be used in the applications of oxide/metal/oxide type transparent electrodes.
Keywords
Sputtering; Aluminum; Thin film growth; Transparent electrode; Electrical resistance;
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Times Cited By KSCI : 1  (Citation Analysis)
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