1 |
Y. Lantasov, R. Palmans, and K. Maex, "New plating bath for electroless copper deposition on sputtered barrier layers", Microelectron. Engineer., 50, 441 (2000).
DOI
|
2 |
W. Zhang, S. H. Brongersma, T. Clarysse, V. Terzieva, E. Rosseel, W. Vandervorst,and K. Maex, "Surface and grain boundary scattering studied in beveled polycrystalline thin copper films", J. of Vac. Sci. & Technol. B., 22,1830 (2004).
DOI
|
3 |
C. Zhang, D. Zhao, D. Gu, H. S. Kim, T. Ling, Y. K. R. Wu, and L. J. Guo, "An ultrathin, smooth, and low loss Al doped Ag film and its application as a transparent electrode in organic photovoltaics", Adv. Mater., 26, 5696-5701(2014).
DOI
|
4 |
G. Zhao, W. Wang, T.-S. Bae, S.-G. Lee, C. W. Mun, S. H. Lee, H. Yu, G.-H. Lee, M. K. Song, and J. H. Yun, "Stable ultrathin partially oxidized copper film electrode for highly efficient flexible solar cells", Nat. com., 6, 8830 (2015).
DOI
|
5 |
K. Fuchs, "The conductivity of thin metallic films according to the electron theory of metals", Proc. Cambridge Philos. Soc., 34, 100 (1938).
DOI
|
6 |
E. H. Sondheimer, "The mean free path of electrons in metals", Advances in Physics,1(1), 1 (1952).
DOI
|
7 |
A. F. Mayadas, and M. Shatzkes, "Electrical-resistivity model for polycrystalline films: the case of arbitrary reflection at external surfaces", Phys. Rev. B., 1, 1382 (1970).
DOI
|
8 |
D. Gall, "Electron mean free path in elemental metals", J. of Appl. Phys., 119, 085101 (2016).
DOI
|
9 |
H. Abram, "Grain size measurement by the intercept method", Metallography 4, 59 (1971).
DOI
|
10 |
Y. Shigesato, R. Koshi-ishi, T. Kawashima, and J. Ohsako, "Early stages of ITO deposition on glass or polymer substrates", Vacuum, 59, 614 (2000).
DOI
|
11 |
J. A. Floro, S. J. Hearne, J. A. Hunter, P. Kotula, E. Chason, S. C. Seel, and C. V. Thompson, "The dynamic competition between stress generation and relaxation mechanisms during coalescence of Volmer-Weber thin films", J. Appl. Phys., 89, 4886 (2001).
DOI
|
12 |
D. Choi, and K. Barmak, "On the potential of tungsten as next-generation semiconductor interconnects", Electron. Mater. Lett., 13, 449 (2017).
DOI
|
13 |
W. Zhang, S. H. Brongersma, O. Richard, B. Brijs, R. Palmans, L. Froyen, and K. Maex, "Influence of the electron mean free path on the resistivity of thin metal films", Microelectron. Engineer., 76, 146 (2004).
DOI
|
14 |
J. H. Lee, P. Lee, H. M. Lee, D. J. Lee, S. S. Lee, and S. H. Ko, "Very long Ag nanowire synthesis and its application in a highly transparent, conductive and flexible metal electrode touch panel", Nanoscale, 4, 6408 (2012).
DOI
|
15 |
J. Wu, H. A. Becerril, Z. Bao, Z. Liu, Y. Chen, and P. Peumans, "Organic solar cells with solution-processed graphene transparent electrodes", Appl. Phys. Lett., 92(26), 263302 (2008).
DOI
|
16 |
J. H. Yun, "Transparent Ultrathin Oxygen-Doped Silver Electrodes for Flexible Organic Solar Cells", Adv. Funct. Mater., 24, 1551 (2014).
DOI
|
17 |
D. S. Hecht, D. Thomas, L. Hu, C. Ladous, T. Lam, Y. B. Park, G. Irvin, and P. Drzaic, "Carbon-nanotube film on plastic as transparent electrode for resistive touch screens", J. of the SID.,17(11), 941 (2009).
|