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http://dx.doi.org/10.11629/jpaar.2017.6.30.053

Development of particle focusing device to monitor various low pressure processes  

Kim, Myungjoon (Environmental System Research Division, Korea Institute of Machinery and Materials)
Kim, Dongbin (School of Mechanical Engineering, Sungkyunkwan University)
Kang, Sang-Woo (Vacuum Center, Korea Research Institute of Standards and Science)
Kim, Taesung (School of Mechanical Engineering, Sungkyunkwan University)
Publication Information
Particle and aerosol research / v.13, no.2, 2017 , pp. 53-63 More about this Journal
Abstract
As semiconductor process was highly integrated, particle contamination became a major issue. Because particle contamination is related with process yields directly, particles with a diameter larger than half pitch of gate should be controlled. PBMS (Particle beam mass spectrometry) is one of powerful nano particle measurement device. It can measure 5~500 nm particles at ~ 100 mtorr condition in real time by in-situ method. However its usage is restricted to research filed only, due to its big device volume and high price. Therefore aperture changeable aerodynamic lenses (ACALs) which can control particle focusing characteristics by changing its aperture diameter was proposed in this study. Unlike conventional aerodynamic lenses which changes particle focusing efficiency when operating condition is changed, ACALs can maintain particle focusing efficiency. Therefore, it can be used for a multi-monitoring system that connects one PBMS and several process chambers, which greatly improves the commercialization possibility of the PBMS. ACALs was designed based on Stokes number and evaluated by numerical method. Numerical analysis results showed aperture diameter changeable aerodynamic lenses can focus 5 to 100 nm standard particles at 0.1 to 10 torr upstream pressure.
Keywords
Aerodynamic lenses; Aperture diameter changeable lens; CFD; Particle focusing;
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1 Ziemann, P. J., Liu, P., Rao, N.P., Kittelson, D.B., and Mcmurry, P.H. (1995). Particle-beam mass-spectrometry of submicron particles charged to saturation in an electron-beam. Journal of Aerosol Science 26(5), 745-756.   DOI
2 Na, J., Kim, T., Choi, J.B., Kim, Y.J., Shin, Y.H., Yun, J.Y., and Kang, S.W. (2010). Effects of process variables on TiN particle formation during metallorganic chemical vapor deposition. Electrochemical and Solid State Letters, 13(7), H248-H252.   DOI
3 O'Hanlon, J.F. (1992). Impact of vacuum equipment contamination on semiconductor yield. Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 10(4), 1863-1868.   DOI
4 Qi, L., McMurry, P. H., Norris, D. J., and Girshick, S. L. (2010). Micropattern Deposition of Colloidal Semiconductor Nanocrystals by Aerodynamic Focusing. Aerosol Science and Technology, 44(1), 55-60.   DOI
5 Schreiner, J., Schild, U., Voigt, C., and Mauersberger, K. (1999). Focusing of Aerosols into a Particle Beam at Pressures from 10 to 150 Torr. Aerosol Science and Technology, 31(5), 373-382.   DOI
6 Selwyn, G.S., and Patterson, E.F. (1992). Plasma particulate contamination control. II. Self-cleaning tool design. Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 10(4), 1053-1059.   DOI
7 Semiconductor Industry Association. (2015). International Technology Roadmap for Semiconductors 2015, http://public.itrs.net/Files/2003ITRS/Home2003.htm.
8 Takahashi, K.M., and Daugherty, J.E. (1996). Current capabilities and limitations of insitu particle monitors in silicon processing equipment. Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 14(6), 2983-2993.   DOI
9 Wang, X., Kruis, F.E., and McMurry, P.H. (2005a). Aerodynamic focusing of nanoparticles: I. Guidelines for designing aerodynamic lenses for nanoparticles. Aerosol Science and Technology, 39(7), 611-623.   DOI
10 Wang, X., Gidwani, A., Girshick, S.L., and McMurry, P.H. (2005b). Aerodynamic focusing of nanoparticles: II. Numerical simulation of particle motion through aerodynamic lenses. Aerosol Science and Technology, 39(7), 624-636.   DOI
11 Kim, T., Suh, S.M., Girshick, S.L., Zachariah, M.R., McMurry, P.H., Rassel, R.M., Shen, Z., and Campbell, S.A. (2002). Particle formation during low-pressure chemical vapor deposition from silane and oxygen: Measurement, modeling, and film properties. Journal of Vacuum Science & Technology a-Vacuum Surfaces and Films, 20(2), 413-423.   DOI
12 Wang X., and McMurry, P.H. (2006). A Design Tool for Aerodynamic Lens Systems. Aerosol Science and Technology, 40(5), 320-334.   DOI
13 Choi, H., Kim, H., Yoon, D., Lee, J.W., Kang, B.K., Kim, M.S., Park, J.G., Kwon, S.B., and Kim, T. (2013). Development of CO2 gas cluster cleaning method and its characterization. Microelectronic Engineering, 102, 87-90.   DOI
14 Kim, D., Mun, J., Kim, H., Yun, J.Y., Kim, Y.J., Kim, T., Kim, T., and Kang, S.W. (2016). Development of particle characteristics diagnosis system for nanoparticle analysis in vacuum. Review of Scientific Instruments, 87(2), 023304   DOI
15 Lee, K. S., Hwang, T. H., Kim, S. H., Kim, S. H., and Lee, D. (2013). Numerical Simulations on Aerodynamic Focusing of Particles in a Wide Size Range of 30 nm-10 ${\mu}m$. Aerosol Science and Technology, 47(9), 1001-1008.   DOI
16 Lee, K. S., Kim, S., and Lee, D. (2009). Aerodynamic focusing of 5-50 nm nanoparticles in air. Journal of Aerosol Science, 40(12), 1010-1018.   DOI
17 Liu, P., Ziemann, P. J., Kittelson, D. B., and McMurry, P. H. (1995). Generating Particle Beams of Controlled Dimensions and Divergence: I. Theory of Particle Motion in Aerodynamic Lenses and Nozzle Expansions. Aerosol Science and Technology, 22(3), 293-313.   DOI
18 Miyashita, H., Kikuchi, T., Kawasaki, Y., Katakura, Y., and Ohsako. N. (1999). Particle measurements in vacuum tools by in situ particle monitor. Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 17(3), 1066-1070.   DOI