Browse > Article
http://dx.doi.org/10.5757/JKVS.2010.19.2.091

Fabrication of TiO2 Thin Films Using UV-enhanced Atomic Layer Deposition at Room Temperature  

Lee, Byoung-H. (Department of Chemistry, Hanyang University)
Sung, Myung-M. (Department of Chemistry, Hanyang University)
Publication Information
Journal of the Korean Vacuum Society / v.19, no.2, 2010 , pp. 91-95 More about this Journal
Abstract
A UV-enhanced atomic layer deposition (UV-ALD) process was developed to deposit $TiO_2$ thin films on Si substrates using titanium isopropoxide(TIP) and $H_2O$ as precursors with UV light. In the UV-ALD process, the surface reactions were found to be self-limiting and complementary enough to yield a uniform, conformal, pure $TiO_2$ thin film on Si substrates at room temperature. The UV light was very effective to obtain the high-quality $TiO_2$ thin films with good adhesive strength on Si substrates. The UV-ALD process was applied to produce uniform and conformal $TiO_2$ coats into deep trenches with high aspect ratio.
Keywords
Atomic layer deposition; UV; $TiO_2$; Surface saturated reaction; TIP;
Citations & Related Records
Times Cited By KSCI : 2  (Citation Analysis)
연도 인용수 순위
1 T. Yokogawa, S. Yoshii, A. Tsumbajimura, Y. Sasai, and J. Merz, Jpn. J. Appl. Phys. 34, L751 (1995).   DOI
2 B. O'Regan and M. Gratzel, Nature 353, 737 (1991).   DOI
3 H. Ohsaki, Y. Tachibana , A. Mitsui, T. Kamiyama, and Yasuo Hayashi, Thin Solid Films 392, 169 (2001).   DOI
4 J. P. Lee and M. M. Sung, J. Am. Chem. Soc. 126, 28 (2004).   DOI
5 A. Ishizaka and Y.J. Shiraki, J. Electrochem. Soc. 133, 666 (1986).   DOI
6 T. Ohishi, S. Maekawa, and A. Katoh, J. Non-Cryst. Solids 147, 493 (1992).   DOI
7 T. Suntola, Thin Solid Films 216, 84 (1992).   DOI
8 S.A. Campbell, D.C. Gilmer, X. Wang, M. Hsieh, H. Kim, W.L. Gladfelter, and J. Yan, IEEE Trans. Electron. Devices 44, 104 (1997).   DOI
9 김혁, 이주현, 한창희, 김운중, 이연승, 이원준, 나사균, 한국진공학회지 12, 263 (2003).   과학기술학회마을
10 T. Suntola, Mater. Sci. Rep. 4, 261 (1989).   DOI
11 V.G. Bessergenev, I.V. Khmelinskii, R.J.F. Pereira, V.V. Krisuk, A.E. Turgambaeva, and I.K. Igumenov, Vacuum 64, 275 (2002).   DOI
12 이두형, 권새롬, 이석관, 노승정, 한국진공학회지 18, 296, (2009).   과학기술학회마을
13 B. H. Lee, M. K. Ryu, Sung-Y. Choi, K. H. Lee, S. Im, and M. M. Sung, J. Am. Chem. Soc. 129, 16304 (2007).
14 S. Okusaki and T. Ohishi, J. Non-Cryst. Solids 319, 311 (2003).   DOI
15 N. Inoue, H. Yuasa, and M. Okoshi, Appl. Surf. Sci. 197, 393 (2002).   DOI
16 J. Sheng, N. Yoshida, J. Karasawa, and T. Fukami, Sens. Actuators B 41, 131 (1997).   DOI   ScienceOn
17 S. Chao, W.-H. Wang, and C.-C. Lee, Appl. Optics 40, 2177 (2001).   DOI
18 S. Ichikawa and R. Doi, Thin Solid Films 292, 130 (1997).   DOI   ScienceOn
19 J. Aarik, A. Aidla, T. Uustare, M. Ritala, and M. Leskela, Appl. Surf. Sci. 161, 385 (2000).   DOI
20 H. Fukuda, S. Namioka, M. Miura, Y. Ishikawa, M. Yoshino, and S. Nomura, Jpn. J. Appl. Phys. 38, 6034 (1999).   DOI