Development of Improvement Technology for Achieving Higher Throughput Limit Utilized in the Evaluation of Next Generation Dry Pumps

The constant volume flow meter system (the chamber volume in the 22 L class) was developed to estimate the pumping speed of the dry pump used for the industry of the next generation semiconductor and display. In order to insure the validity of the system, The base pressure and the leak rate in the enclosed system were checked, which were the $6{\times}10^{-8}\;mbar$ and $1.5{\times}10^{-6}\;mbar-L/s$, respectively. Furthermore, it is also confirmed that the value of throughput limit in this system was as much as 1 order of magnitude lower than that in a previously developed system in the 875 L class. By using this developed system, the pumping speed of the new small dry pump was measured. It is believed that the new developed system can be alternating the expensive constant pressure flow meter system in the range of $1{\times}10^{-2}\;mbar-L/s{\sim}1{\times}10^{-3}\;mbar-L/s$.

첨단공정용 드라이펌프 유량 측정 한계 향상기술 개발

차세대 반도체 및 디스플레이 산업용 드라이펌프의 배기속도를 평가하기 위해 최소부피 22 L 급의 정적형 유량계를 설계/제작 하였다. 정적형 유량계의 기본 평가항목인 base pressure와 leak rate 측정결과 각각 $6{\times}10^{-8}\;mbar$ 와 $1.5{\times}10^{-6}\;mbar-L/s$로 측정되었고 throughput limit의 경우 기존 875 L 급보다 1 order 낮은 $1{\times}10^{-3}\;mbar-L/s$ 영역까지 확대되었음이 확인되었다. 구축된 시스템을 이용해 배기용량이 적은 최신 공정 드라이 펌프까지도 배기속도 값을 정확히 측정할 수 있으며, 구축비용이 높은 정압형 유량계를 어느 정도 대체할 수 있을 것으로 기대하고 있다.