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http://dx.doi.org/10.5757/JKVS.2009.18.6.403

A Study of Non-uniform Pressure Distribution in Vacuum Chamber during Dynamic Gas Flow  

Khan, Wakil (Vacuum Technology Center)
Hong, K.S. (Vacuum Technology Center)
Hong, S.S. (Vacuum Technology Center)
Publication Information
Journal of the Korean Vacuum Society / v.18, no.6, 2009 , pp. 403-410 More about this Journal
Abstract
Vacuum chambers have wide application for a variety of purposes such as material processing, vacuum gauge calibration, etc. As the dynamic pressure generated in such chamber is non-uniform, in many industrial as well as research processes, it is vital to know the non-uniform gas distribution with associated gas flow regimes and the ways of minimizing these pressure non-uniformities. In the present work, the behavior of gas flow in a vacuum chamber, during continuous gas flow, is described in the pressure range 0.1-133 Pa and the effect of baffle plate in minimizing the pressure non-uniformities is investigated. It was observed that maximum deviations in the pressure occur near the gas inlet point and that the effect of baffle plate in minimizing the pressure non-uniformities is more obvious in the transitional flow regime.
Keywords
Vacuum chamber; Dynamic gas flow; Baffle plate; CDGs;
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Times Cited By KSCI : 2  (Citation Analysis)
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