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http://dx.doi.org/10.5757/JKVS.2007.16.2.122

Physical and Structural Properties of Amorphous Carbon Films Synthesized by Magnetron Sputtering Method  

Park, Yong-Seob (School of Information and Communication Engineering, Sungkyunkwan University)
Cho, Hyung-Jun (School of Information and Communication Engineering, Sungkyunkwan University)
Hong, Byung-You (School of Information and Communication Engineering, Sungkyunkwan University)
Publication Information
Journal of the Korean Vacuum Society / v.16, no.2, 2007 , pp. 122-127 More about this Journal
Abstract
In this research, amophous carbon films (a-C, a-C:H, a-C:N) were synthesized by closed-field unbalanced magnetron (CFUBM) sputtering using graphite target. We also fabricated amorphous carbon films with applying negative DC bias voltage of 200 V in during the deposition in working pressure. Also, a-C:H and a-C:N films was synthesized by adding acethylene($C_{2}H_{2}$) and nitrogen(N) gases of 4 and 3 sccm into Ar pressure. The a-C:H film synthesized at -200 V exhibited the maxumum hardness of 26.3 GPa, the smooth surface of 0.1 nm and the good adhesion of 30.5 N. And a-C:N film synthesized at -200 V exhibited at -200 V exhibited the best adhesion of 32 N. This paper examined the effect of $C_{2}H_{2}$ gas, $N_{2}$ gas and negative DC bias voltage as the parameter for improving the physical properties and the relation between structral and physical properties of carbon films.
Keywords
closed-field unbalanced magnetron sputtering; amorphous carbon film; Raman; hardness; adhesion;
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