SOI wafer formation by ion-cut process and its characterization |
Woo H-J
(Ion Beam Application Group, Korea Institute of Geoscience & Mineral Resoruces)
Choi H-W (Ion Beam Application Group, Korea Institute of Geoscience & Mineral Resources) Bae Y-H (Division of Information & Communication Engineering, Uiduk University) Choi W-B (BNP Science) |
1 | A. Ploessel and G. Krauter, Solid-State Electronics 44, 775 (2000) DOI ScienceOn |
2 | Q.- Y. Tong and U. Goesele, Semiconductor Wafer Bonding-Science & Technology (John Wiley & Sons, New York, 1999), pp. 1-15 |
3 | Michel Bruel, Nucl. Instr. Meth. 108, 313 (1996) DOI ScienceOn |
4 | 우형주, 최한우, 김준곤, 지영용, 한국진공학회지 13, 1 (2004) |
5 | Sorin Cristoloveanu, J. Korean Phy. Soc. 39, 52 (2001) |
6 | A. Ploessel and G. Krauter, Materials Science & Engineering R 25, 1 (1999) DOI ScienceOn |
7 | J. Haisma and G.A.C.M. Spierings, Mat. Sci. Eng. R 269, 1 (2002) |
8 | Ionut Radu, Layer transfer of semiconductors and complex oxides by helium and/or hydrogen implantation and wafer bonding, PhD thesis, Martin-Luther University Halle- Wittenberg (2003) |
9 | B. Aspar, M. Bruel, H. Moriceau, C. Maleville, T. Poumeyrol, A.M. Papon, A. Claverie, and G. Benassayag, Microelectronic Engineering 36, 233 (1997) DOI ScienceOn |
10 | C. H. Yun and N. W. Cheung, J. Microelectro-mechanical Systems 9, 474 (2000) DOI ScienceOn |
11 | W. Kern, Handbook of Semiconductor Wafer Cleaning Technology (Noyes Publications, New Jersey, 1993), p. 49 |
12 | G. D. Arrigo, S. Coffa, and C. Spinella, Sensors and Actuators A 3278, 1 (2002) |
13 | J. D. Hunn, S. P. Withrow, C. W. White, R. E. Clausing, L. Heatherly, C. P. Christian, and N. R. Parikh, Nucl. Instr. Meth. B 99, 602 (1995) DOI ScienceOn |
14 | S. S. Iyer and A. J. Auberton-Herve, Silicon Wafer Bonding Technology for VLSI and MEMS Applications (INSPEC, IEE, London, 2002) |
15 | C. Maleville, B. Aspar, T. Poumeyrol, H. Moriceau, M. Bruel, A. J. Auberton-Herve, and T. Barge, Mat. Sci. & Eng. B 46, 14 (1997) DOI ScienceOn |
16 | S. Cristoloveanu, Solid State Electronics 45, 1403 (2001) DOI ScienceOn |
17 | A Berthold, B. Jakoby, and M. J. Vellekoop, Sensors and Actuators A 68, 410 (1998) DOI ScienceOn |
18 | T. W. Simpson, I. V. Mitchell, G. O. Este, and F. R. Shepherd, Nucl. Instr. Meth. B 148, 381 (1999) DOI ScienceOn |