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Varification of Phase Defect Correctability of Nano-structured Multilayer for EUV Reflection  

Lee, Seung-Yoon (Division of Materials Science and Engineering, Hanyang University)
Kim, Tae-Geun (Division of Materials Science and Engineering, Hanyang University)
Jinho Ahn (Division of Materials Science and Engineering, Hanyang University)
Publication Information
Journal of the Korean Vacuum Society / v.12, no.S1, 2003 , pp. 40-45 More about this Journal
Abstract
Ru interfacial layer was inserted into Mo-on-Si interface to enhance the extreme ultra-violet (EUV) reflective multilayer properties. The stacking status and optical properties are analyzed using cross-sectional transmission electron microscope (TEM), and reflectometer. About 1.5% of maximum reflectivity can be acquired as predicted in optical simulation, which is thought to be originated from the diffusion inhibition property. Phase defect correctability of the multilayer can be enhanced by the insertion of Ru barrier layer.
Keywords
EUVL; multilayer; Mo/Si; barrier layer; reflectivity; Phase defect; correction;
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