Browse > Article
http://dx.doi.org/10.3807/COPP.2020.4.1.016

Plasmonic Color Filter with Robustness Against Cross Talk for Compact Imaging Applications  

Cho, Hyo Jong (School of Electronics Engineering, Kyungpook National University)
Do, Yun Seon (School of Electronics Engineering, Kyungpook National University)
Publication Information
Current Optics and Photonics / v.4, no.1, 2020 , pp. 16-22 More about this Journal
Abstract
In high resolution imaging devices, smaller aperture in the color filter causes cross talk which provides incorrect information. Plasmonic color filters (PCFs) have been reported as an alternative of the conventional color resist based-color filter (CRCF) and many studies on PCFs demonstrated the filtering function by PCFs with a sub-micron size. In this work, we investigated the cross talk performance of PCFs compared to CRCFs. The effect of cross talk over distance from the filter were measured for each filter. Despite poorer spectral filtering characteristics, PCFs were more robust against cross talk than CRCFs. Also, the further away from the filter, the more cross talk appeared. As a result, PCFs showed less cross talk than CRCFs at about 82% of the results measured at a distance of 2~10 ㎛. This study will help to make practical use of PCFs in high-resolution imaging applications.
Keywords
Color filter; Cross talk; Surface plasmon; Nano photonics;
Citations & Related Records
연도 인용수 순위
  • Reference
1 M. Mori, M. Katsuno, S. Kasuga, T. Murata, and T. Yamaguchi, "1/4-inch 2-mpixel MOS image sensor with 1.75 transistors/pixel," IEEE J. Solid-State Circuits 39, 2426-2430 (2004).   DOI
2 Y. S. Do, "A highly reproducible fabrication process for large-area plasmonic filters for optical applications," IEEE Access 6, 68961-68967 (2018).   DOI
3 Y. S. Do and K. C. Choi, "Poly-periodic hole arrays for angle-invariant plasmonic filters," Opt. Lett. 40, 3873-3876 (2015).   DOI
4 S. P. Chang, Y. S. Do, J. W. Kim, B. Y. Hwang, J. N. Choi, B. H. Choi, Y. H. Lee, K. C. Cho, and B. K. Ju, "Photo-insensitive amorphous oxide thin-film transistor integrated with a plasmonic filter for transparent electronics," Adv. Funct. Mater. 24, 3482-3487 (2014).   DOI
5 Y. S. Do and K. C. Choi, "Quantitative interpretation of extraordinary optical transmission affected by dielectric overlayers," J. Opt. 16, 065005-065010 (2014).   DOI
6 Y. S. Do, J. H. Park, B. Y. Hwang, S. M. Lee, B. K. Ju, and K. C. Choi, "Plasmonic color filter and its fabrication method for large area applications," Adv. Opt. Mater. 1, 133-138 (2013).   DOI
7 Y. S. Do and K. C. Choi, "Matching surface plasmon modes in symmetry-broken structures for nanohole-based plasmonic color filter," IEEE Photonics Technol. Lett. 25, 2454-2457 (2013).   DOI
8 B. E. Bayer, "Color imaging array," U.S. Patent 3971065 (1976).
9 Lumerical Solution Inc., Lumerical FDTD solution (FDTD Solution, Jul. 29, 2019), https://www.lumerical.com/products/fdtd/ (Aug. 5, 2019).
10 Y. Yu, Q. Chen, L. Wen, X. Hu, and H. Zhang, "Spatial optical crosstalk in CMOS image sensors integrated with plasmonic color filters," Opt. Express 23, 21994-22003 (2015).   DOI
11 S. Yokogawa, S. P. Burgos, and H. A. Atwater, "Plasmonic color filters for CMOS image sensor applications," Nano Lett. 12, 4349-4354 (2012).   DOI
12 H. F. Ghaemi, T. Thio, D. E. Grupp, T. W. Ebbesen, and H. J. Lezec, "Surface plasmons enhance optical transmission through subwavelength holes," Phys. Rev. B 58, 6779-6782 (1998).   DOI
13 A. P. Chandrakasan and R. W. Brodersen, "Minimizing power consumption in digital CMOS circuits," Proc. IEEE 83, 498-523 (1995).   DOI
14 E. J. Nowak, I. Aller, T. Ludwing, K. Kim, R. V. Joshi, C. T. Chuang, K. Bernstein, and R. Puri, "Turning silicon on its edge [double gate CMOS/FinFET technology]," IEEE Circuits Devices Mag. 20, 20-31 (2004).   DOI
15 G. Agranov, V. Berezin, and R. H. Tsai, "Crosstalk and microlens study in a color CMOS image sensor," IEEE Trans. Electron Devices 50, 4-11 (2003).
16 B. E. A. Saleh and M. C. Teich, Fundamentals of Photonics (John Wiley & Sons, USA, 2019), Vol. 2, Chapter 4.
17 L. Frey, P. Parrein, J. Raby, C. Pelle, D. Herault, M. Marty, and J. Michailos, "Color filters including infrared cut-off integrated on CMOS image sensor," Opt. Express 19, 13073-13080 (2011).   DOI
18 S. Nishiwaki, T. Nakamura, M. Hiramoto, T. Fujii, and M. Suzuki, "Efficient colour splitters for high-pixel-density image sensors," Nat. Photonics 7, 240-246 (2013).   DOI
19 W. L. Barnes, A. Dereux, and T. W. Ebbesen, "Surface plasmon subwavelength optics," Nature 424, 824-830 (2003).   DOI
20 S. J. Tan, L. Zhang, D. Zhu, X. M. Goh, Y. M. Wang, K. Kumar, C. W. Qiu, and J. K. W. Yang, "Plasmonic color palettes for photorealistic printing with aluminum nanostructures," Nano Lett. 14, 4023-4029 (2014).   DOI
21 P. A. H. Hart, T. Va 'T Hof, and F. M. Klaassen, "Device down scaling and expected circuit performance," IEEE J. Solid-State Circuits 14, 343-357 (1979).   DOI
22 H. S. Lee, Y. T. Yoon, S. S. Lee, S. H. Kim, and K. D. Lee, "Color filter based on a subwavelength patterned metal grating," Opt. Express 15, 15457-15463 (2007).   DOI
23 C. Genet and T. W. Ebbesen, "Light in tiny holes," Nature 445, 39-46 (2007).   DOI
24 T. W. Ebbesen, H. J. Lezaec, H. F. Ghaemi, T. Thio, and P. A. Wolf, "Extraordinary optical transmission through subwavelength hole arrays," Nature 391, 667-669 (1998).   DOI