1 |
C. A. Mack, Fundamental Principles of Optical Lithography: The Science of Microfabrication, 1st ed. (Wiley, Chichester, England, 2007), pp. 223-230.
|
2 |
R. L. Brainard, M. Neisser, G. Gallatin, and A. Narasimhan, "Photoresists for EUV lithography," in EUV Lithography, 2nd ed., V. Bakshi, Ed. (SPIE, Bellingham, USA, 2018), pp. 493-591.
|
3 |
F. H. Dill, "Optical lithography," IEEE Trans. Electron. Devices 22, 440-444 (1975).
DOI
|
4 |
H. J. Levinson, Principles of Lithography, 2nd ed. (SPIE, Bellingham, USA, 2005), pp. 70-72.
|
5 |
H. J. Levinson, Extreme Ultaviolet Lithography, 1st ed. (SPIE, Bellingham, USA, 2020), pp. 111-126.
|
6 |
F. H. Dill, W. P. Hornberger, P. S. Hauge, and J. M. Shaw, "Characterization of positive photoresist," IEEE Trans. Electron Devices 22, 445-452 (1975).
DOI
|
7 |
J.-R. Park, J. Sierchio, M. Zaverton, Y. Kim, and T. D. Milster, "Characterization of photoresist and simulation of a developed resist profile for the fabrication of gray-scale diffractive optic elements," Opt. Eng. 51, 023401 (2012).
DOI
|
8 |
J.-R. Park, Y. Kim, and T. D. Milster, "Analysis of a laser direct writer with an acousto-optic modulator employed for dose gray-scaling," J. Korean Phys. Soc. 59, 3289-3292 (2011).
DOI
|
9 |
C. A. Mack, "Development of positive photoresists," J. Electrochem. Soc. 134, 148-152 (1987).
DOI
|
10 |
B. J. Lin, Optical Lithography: Here Is Why, 1st ed. (SPIE, Bellingham, USA, 2010), pp. 167-170.
|
11 |
S. V. Babu and E. Barouch, "Exact solution of Dill's model equation for positive photoresist kinetics," IEEE Electron. Device Lett. 7, 252-253 (1986).
DOI
|
12 |
F. H. Dill, A. R. Neureuther, J. A. Tuttle, and E. J. Walker, "Modeling projection printing of positive photoresists," IEEE Trans. Electron Devices 22, 456-464 (1975).
DOI
|
13 |
C. A. Mack, Field Guide to Optical Lithography, 1st ed. (SPIE, Bellingham, USA, 2006), pp. 41-52.
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